Aethyl-diphenyl-sulfonium | 29245-67-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Aethyl-diphenyl-sulfonium
• 英文别名: Diphenyl-ethyl-sulfonium；Diphenyl-aethyl-sulfonium；Ethyl(diphenyl)sulfanium
• CAS: 29245-67-8
• 化学式: C₁₄H₁₅S
• 分子量: 215.339
• InChiKey: LFUUKAZOASZIBN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  1
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• [EN] COMPOUNDS CONTAINING ALKYL-CYANO-BORATE OR ALKYL-CYANO-FLUOROBORATE ANIONS<br/>[FR] COMPOSÉS CONTENANT LES ANIONS ALKYLE, CYANO, BORATE OU ALKYLE, CYANO, FLUOROBORATE
  申请人：MERCK PATENT GMBH

  公开号：WO2013010641A1

  公开（公告）日：2013-01-24

  The invention relates to new compounds containing alkyl/alkenyl-cyano- borate or alkyl/a!kenyl-cyano-fluoroborate anions, their preparation and their use, in particular as part of electrolyte formulations for electrochemical or optoelectronic devices.

  该发明涉及包含烷基/烯基-氰基硼酸或烷基/烯基-氰基氟硼酸阴离子的新化合物，它们的制备及其用途，尤其是作为电化学或光电子设备电解质配方的一部分。
• PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES
  申请人：FUJIWARA Masaki

  公开号：US20080108846A1

  公开（公告）日：2008-05-08

  A process for producing an alkoxycarbonylfluoroalkanesulfonate represented by the formula [1] is provided. This process includes the steps of (a) reacting a halofluoroalkanoate represented by the formula [2], with a sulfinating agent, thereby obtaining an alkoxycarbonylfluoroalkanesulfinate represented by the formula [3]; and (b) reacting the alkoxycarbonylfluoroalkanesulfinate with an oxidizing agent, thereby obtaining the target alkoxycarbonylfluoroalkanesulfonate. Furthermore, it is possible to react the obtained alkoxycarbonylfluoroalkanesulfonate with a monovalent onium salt to conduct a salt exchange, thereby obtaining a alkoxycarbonylfluoroalkanesulfonic acid onium salt represented by the formula [4].

  提供了一种制备由公式[1]表示的烷氧羰基氟代烷磺酸盐的方法。这个过程包括以下步骤：(a)使由公式[2]表示的卤氟代烷酸盐与亚磺化剂反应，从而获得由公式[3]表示的烷氧羰基氟代烷亚磺酸盐；以及(b)使烷氧羰基氟代烷亚磺酸盐与氧化剂反应，从而获得目标烷氧羰基氟代烷磺酸盐。此外，可以将获得的烷氧羰基氟代烷磺酸盐与单价阳离子盐进行反应，进行盐交换，从而获得由公式[4]表示的烷氧羰基氟代烷磺酸阳离子盐。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：Ichikawa Koji

  公开号：US20110014566A1

  公开（公告）日：2011-01-20

  A salt represented by the formula (I-Pa): wherein X pa represents a single bond or a C1-C4 alkylene group, R pa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Y pa represents a polymerizable group, and Z pa+ represents an organic cation.

  由公式(I-Pa)表示的盐，其中Xpa代表单一键或C1-C4亚烷基团，Rpa代表单一键、C4-C36二价脂环烃基团或C6-C36二价芳香烃基团，且脂环烃基团中的一个或多个亚甲基基团可以被—O—或—CO—替换，Ypa代表可聚合团，Zpa+代表有机阳离子。
• ISOQUINOLINES AS INHIBITORS OF HPK1
  申请人：Genentech, Inc.

  公开号：US20180282282A1

  公开（公告）日：2018-10-04

  Isoquinoline compounds and their use as inhibitors of HPK1 (hematopoietic kinase 1) are described. The compounds are useful in treating HPK1-dependent disorders and enhancing an immune response. Also described are methods of inhibitng HPK1, methods of treating HPK1-dependent disorders, methods for enhancing an immune response, and methods for preparing the isoquinoline compounds.

  描述了异喹啉化合物及其作为HPK1（造血激酶1）抑制剂的用途。这些化合物在治疗依赖于HPK1的疾病和增强免疫应答方面非常有用。还描述了抑制HPK1的方法、治疗依赖于HPK1的疾病的方法、增强免疫应答的方法，以及制备异喹啉化合物的方法。
• Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
  申请人：Central Glass Company, Limited

  公开号：US20130130175A1

  公开（公告）日：2013-05-23

  A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R 1 represents a monovalent organic group, and Q + represents a sulfonium cation or iodonium cation.

  以下是用作优良的辐射敏感性酸发生剂的磺酸醋銨盐的化学式（1）。通过使用含有与化学式（1）对应的磺酸醋銨盐的抗蚀组合物，可以形成良好的图案： 其中R1代表一价有机基团，Q+代表磺銨阳离子或碘銨阳离子。