Sulfonium compound, positive resist composition, and resist pattern forming process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US11124477B2
公开(公告)日:2021-09-21
A novel sulfonium compound has formula (A). A positive resist composition comprising a polymer and a quencher containing the sulfonium compound is improved in resolution and LER during pattern formation and has storage stability. In formula (A), R1, R2, R3, and R4 are independently a C1-C20 monovalent hydrocarbon group, p is an integer of 0-5, q is an integer of 0-5, and r is an integer of 0-4.
一种新型锍化合物具有式 (A)。由含有该锍化合物的聚合物和淬火剂组成的正抗蚀剂组合物在图案形成过程中可提高分辨率和 LER,并具有储存稳定性。在式 (A) 中,R1、R2、R3 和 R4 独立地为 C1-C20 单价烃基,p 为 0-5 的整数,q 为 0-5 的整数,r 为 0-4 的整数。