1-dodecyl-2-methyl-pyridinium; chloride | 4086-74-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡啶及其衍生物
• 英文名称: 1-dodecyl-2-methyl-pyridinium; chloride
• 英文别名: N-laurylpicolinium chloride；1-Dodecyl-2-methylpyridin-1-ium chloride；1-dodecyl-2-methylpyridin-1-ium;chloride
• CAS: 4086-74-2
• 化学式: C₁₈H₃₂N*Cl
• 分子量: 297.912
• InChiKey: TVFWSIQTAXZIPC-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.21
• 重原子数：
  20
• 可旋转键数：
  11
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.72
• 拓扑面积：
  3.9
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  碳酸甲丙酯 、 1-氯十二烷 生成 1-dodecyl-2-methyl-pyridinium; chloride
  参考文献：
  名称：

  Kolloff et al., Journal of the American Pharmaceutical Association (1912), 1942, vol. 31, p. 51

  摘要：

  DOI：

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210286266A1

  公开（公告）日：2021-09-16

  The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10 , and R 1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q 1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X 1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

  本发明是一种用于形成有机薄膜的材料，包括：由以下通用式（1）所示的化合物；和有机溶剂，在通用式（1）中，X代表具有2至50个碳原子或一个氧原子的价为“n”的有机基团，“n”表示1到10的整数，R1独立地表示以下通用式（2）中的任何一种，其中在通用式（2）中，虚线表示连接点到X，Q1表示含有羰基的一价有机基团，其中至少部分是以下通用式（3）所示的基团，其中在通用式（3）中，虚线表示连接点，X1表示单键或具有1到20个碳原子的二价有机基团，在有机基团具有芳香环时可选地具有取代基，R2表示氢原子、甲基基团、乙基基团或苯基团，**表示连接点。本发明的目的是提供一种用于形成具有干法刻蚀抗性的有机薄膜的材料，同时具有高填充和平整化性能以及对基底的粘附性。
• METHOD FOR MANUFACTURING AN EPOXY COMPOUND AND METHOD FOR EPOXIDIZING A CARBON-CARBON DOUBLE BOND
  申请人：Takumi Kiyoshi

  公开号：US20120108830A1

  公开（公告）日：2012-05-03

  The present invention provides a method for producing an epoxy compound, comprising oxidizing a carbon-carbon double bond of an organic compound by hydrogen peroxide in the presence of a neutral inorganic salt and a mixed catalyst of a tungsten compound (a), at least one phosphorus compound selected from the group consisting of phosphoric acids, phosphonic acids, and salts thereof (b) and a surfactant (c), and an epoxidizing method comprising oxidizing a carbon-carbon double bond by hydrogen peroxide in the presence of the catalyst and the neutral inorganic salt.

  本发明提供了一种生产环氧化合物的方法，包括在中性无机盐和钨化合物（a）、磷酸、膦酸及其盐（b）和表面活性剂（c）的混合催化剂存在下，通过过氧化氢氧化有机化合物的碳-碳双键，以及一种环氧化方法，包括在催化剂和中性无机盐存在下，通过过氧化氢氧化碳-碳双键。
• PRODUCTION METHOD FOR 1,2,3,5,6-PENTATHIEPANE
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：US20210009553A1

  公开（公告）日：2021-01-14

  The present invention enables provision of a production method for 1,2,3,5,6-pentathiepane, the method comprising, in the following order, step A for reacting a trithiocarbonate, sulfur, and a methane dihalide together using a phase-transfer catalyst in a multilayer system having a water layer and an organic layer, step B for separating the water layer from the organic layer, and step C for stopping the reaction using an acid.

  本发明实现了一种用于1,2,3,5,6-五硫代戊烷的生产方法，该方法依次包括以下步骤：步骤A，使用相转移催化剂在具有水层和有机层的多层系统中将三硫代碳酸酯、硫和甲烷二卤化物一起反应；步骤B，将水层与有机层分离；步骤C，使用酸停止反应。
• METHOD OF PRODUCING EPOXY COMPOUNDS
  申请人：Uchida Hiroshi

  公开号：US20110263882A1

  公开（公告）日：2011-10-27

  Provided is a method of efficiently producing an epoxy compound from an allyl ether having an aromatic ring under mild conditions by using hydrogen peroxide as an oxidizing agent without using an organic solvent. The method of producing an epoxy compound comprises reacting an allyl ether having an aromatic ring with hydrogen peroxide to epoxidize a carbon-carbon double bond of an allyl group to thereby produce a corresponding epoxy compound having an aromatic ring, wherein water only is used as a solvent without using an organic solvent, and a tungsten compound, and a tertiary amine and/or a quaternary ammonium salt, are used as a reaction catalyst.

  提供了一种在温和条件下使用过氧化氢作为氧化剂，而无需使用有机溶剂，从具有芳香环的烯丙基醚高效生产环氧化合物的方法。生产环氧化合物的方法包括将具有芳香环的烯丙基醚与过氧化氢反应，使烯丙基团的碳-碳双键环氧化，从而产生具有芳香环的相应环氧化合物，其中仅使用水作为溶剂，不使用有机溶剂，并且使用钨化合物、三级胺和/或季铵盐作为反应催化剂。
• ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160053087A1

  公开（公告）日：2016-02-25

  The present invention provides an ultraviolet absorber containing a compound represented by the formula (A-1), wherein R represents a methyl group, an ethyl group, a propyl group, or an allyl group, and R 1 , R 2 , R 3 , and R 4 may be the same or different, and each represent a hydrogen atom, a benzoyl group, a toluoyl group, a naphthoyl group, or an anthranoyl group. By adding the ultraviolet absorber to a composition for forming a resist under layer film, reflection can be suppressed particularly in lithography process by an ultraviolet laser, and a pattern profile can be improved without adverse effects on dry etching mask properties and adhesiveness to a resist pattern.

  本发明提供了一种含有式（A-1）所代表的化合物的紫外线吸收剂，其中R代表甲基基团、乙基基团、丙基基团或烯丙基基团，而R1、R2、R3和R4可以相同也可以不同，每个代表氢原子、苯甲酰基、甲苯酰基、萘甲酰基或蒽甲酰基。通过将紫外线吸收剂添加到用于形成抗蚀底层膜的组合物中，可以在紫外线激光的光刻过程中特别抑制反射，并且可以改善图案轮廓而不会对干法刻蚀掩模特性和对抗蚀图案的附着性产生不良影响。