1,4-dithiepane-2-yl methacrylate | 1184287-59-9

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫代缩醛
• 英文名称: 1,4-dithiepane-2-yl methacrylate
• 英文别名: 1,4-Dithiepan-2-yl 2-methylprop-2-enoate
• CAS: 1184287-59-9
• 化学式: C₉H₁₄O₂S₂
• 分子量: 218.341
• InChiKey: LFXYLOKVBXZJDN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  76.9
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  1,4-dithiepane-2-ol 、 甲基丙烯酰氯 在 吩噻嗪 、 三乙胺 、 4-二甲氨基吡啶 作用下， 以 四氢呋喃 、 水 为溶剂， 反应 2.0h， 生成 1,4-dithiepane-2-yl methacrylate
  参考文献：
  名称：

  METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF

  摘要：

  提供了以下内容：1）一种丙烯酸酯衍生物的生产工艺，该衍生物可以作为聚合物的原料，用于获得一种光阻组合物，该光阻组合物能形成一种对酸具有良好反应性和热稳定性的光阻膜，并且在显影时膨胀较少，其折射率在193纳米时最好为1.72或更高，并且可以进行图案化；2）通过上述生产工艺获得的丙烯酸酯衍生物；以及3）用于上述丙烯酸酯衍生物的合成中间体醇和酯。

  公开号：

  US20110009643A1

文献信息

• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120295201A1

  公开（公告）日：2012-11-22

  A compound represented by formula (I): wherein T 1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W 1 and ring W 2 each independently represent a C3-C36 hydrocarbon ring, R 1 and R 2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R 3 and R 4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R 5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

  一个由化学式(I)表示的化合物：其中T1代表一个单键或一个C6-C14芳香烃基，L1代表一个C1-C17二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，L2和L3分别独立地代表一个单键或一个C1-C6二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，环W1和环W2分别独立地代表一个C3-C36碳氢环，R1和R2分别独立地代表一个氢原子、一个羟基或一个C1-C6烷基基团，R3和R4分别独立地代表一个羟基或一个C1-C6烷基基团，R5代表一个羟基或一个甲基基团，m代表0或1，t和u分别独立地代表0到2之间的整数。
• Oxime Compound and Resist Composition Containing the Same
  申请人：MASUYAMA Tatsuro

  公开号：US20100021847A1

  公开（公告）日：2010-01-28

  An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R 1 ) represents a C1-C30 aliphatic hydrocarbon group etc., R 2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q 1 and Q 2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：Ichikawa Koji

  公开号：US20110053082A1

  公开（公告）日：2011-03-03

  A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that optionally has one or more halogen atoms; X 1 represents a C 2 to C 36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C 1 to C 24 hydrocarbon group, a C 1 to C 12 alkoxyl group, a C 2 to C 4 acyl group, or a C 2 to C 4 acyloxy group, and one or more —CH 2 — contained in the heterocyclic group may be replaced by —CO— or —O—.
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110200935A1

  公开（公告）日：2011-08-18

  The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): wherein R 1 and R 2 independently represent a hydrogen atom, a C1-C12 aliphatic hydrocarbon group, a C3-C20 saturated cyclic hydrocarbon group, a C6-C20 aromatic hydrocarbon group or a C7-C21 aralkyl group, and the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group can have one or more substituents selected from the group consisting of a hydroxyl group, a cyano group, a fluorine atom, a trifluoromethyl group and a nitro group, and one or more —CH 2 — in the aliphatic hydrocarbon group can be replaced by —O— or —CO—, or R 1 and R 2 are bonded each other to form a C4-C20 nitrogen-containing ring together with the nitrogen atom to which they are bonded, an acrylic resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：YOSHIDA Isao

  公开号：US20120052440A1

  公开（公告）日：2012-03-01

  The present invention provides a salt represented by the formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 and L 2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, ring W 1 and ring W 2 independently each represent a C3-C36 aliphatic ring, R 2 is independently in each occurrence a C1-C6 alkyl group, R 4 is independently in each occurrence a C1-C6 alkyl group, R 3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z + represents an organic counter ion.