trimethyl phenyl ammonium ethylate | 17310-97-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: trimethyl phenyl ammonium ethylate
• 英文别名: N,N,N-Trimethylanilinium acetate；trimethyl(phenyl)azanium;acetate
• CAS: 17310-97-3
• 化学式: C₂H₃O₂*C₉H₁₄N
• 分子量: 195.261
• InChiKey: DLSULYIQRAZOPW-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  0.64
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  monomethylthallium diacetate 、 N,N-二甲基苯胺 以 氘代甲醇 为溶剂， 生成 trimethyl phenyl ammonium ethylate
  参考文献：
  名称：

  Knips, Ulrich; Huber, Friedo, Zeitschrift fur Naturforschung, Teil B: Anorganische Chemie, Organische Chemie, 1983, vol. 38, # 4, p. 434 - 436

  摘要：

  DOI：

文献信息

• Acrylonitrile Derivatives from Epoxide and Carbon Monoxide Reagents
  申请人：Novomer, Inc.

  公开号：US20190002400A1

  公开（公告）日：2019-01-03

  The present invention is directed to reactor systems and processes for producing acrylonitrile and acrylonitrile derivatives. In preferred embodiments of the present invention, the processes comprise the following steps: introducing an epoxide reagent and carbon monoxide reagent to at least one reaction vessel through at least one feed stream inlet; contacting the epoxide reagent and carbon monoxide reagent with a carbonylation catalyst to produce a beta-lactone intermediate; polymerizing the beta-lactone intermediate with an initiator in the presence of a metal cation to produce a polylactone product; heating the polylactone product under thermolysis conditions to produce an organic acid product; optionally esterifying the organic acid product to produce one or more ester products; and reacting the organic acid product and/or ester product with an ammonia reagent under ammoxidation conditions to produce an acrylonitrile product.

  本发明涉及反应器系统和生产丙烯腈及丙烯腈衍生物的工艺。在本发明的优选实施例中，该工艺包括以下步骤：将环氧试剂和一氧化碳试剂通过至少一个进料流入口引入至至少一个反应釜中；将环氧试剂和一氧化碳试剂与羰基化催化剂接触以产生β-内酯中间体；在金属阳离子存在下，将β-内酯中间体与引发剂聚合以产生聚内酯产品；在热解条件下加热聚内酯产品以产生有机酸产品；可选择酯化有机酸产品以产生一个或多个酯产品；并将有机酸产品和/或酯产品与氨试剂在氨氧化条件下反应以产生丙烯腈产品。
• Verwendung von quartären Ammoniumsalzen als latente Katalysatoren in Beschichtungsmassen auf Basis von Polyurethan- oder Epoxiharz-Vorprodukten, die diese Katalysatoren enthaltenden Beschichtungsmassen, sowie ein Verfahren zur Herstellung von Beschichtungen
  申请人：BAYER AG

  公开号：EP0028696A1

  公开（公告）日：1981-05-20

  Die Erfindung betrifft die Verwendung von unter dem Einfluß von Licht der Wellenlänge 250-500 nm tertiäre Amine abspaltenden quatären Ammoniumsalzen, insbesondere solchen auf Basis von tertiären Aminen des Molekulargewichtsbereichs 59-500, als latente Katalysatoren in Beschichtungsmassen auf Basis von Polyurethan- oder Epoxiharz-Vorprodukten, derartige Ammoniumsalze enthaltende Beschichtungsmassen der gennannten Art, sowie ein Verfahren zur Herstellung von Überzügen bei welchem man beliebige Substrate mit derartigen Beschichtungsmassen beschichtet und anschließend die Beschichtung durch Bestrahlung mit Licht einer Wellenlänge zwischen 250 und 500 nm aushärtet.

  本发明涉及在波长为 250-500 纳米的光的影响下可分裂出叔胺的季铵盐，特别是 基于分子量范围为 59-500 的叔胺的季铵盐，在基于聚氨酯或环氧树脂前体的涂料组合物中作 为潜在催化剂的用途、含有此类铵盐的上述类型的涂料组合物，以及一种涂料生产工艺，在该工艺中，用此类涂料组合物涂覆任何基材，然后用波长在 250 至 500 纳米之间的光照射使涂层固化。
• Process for the production of aromatic polycarbonate
  申请人：TEIJIN LIMITED

  公开号：EP0667366A2

  公开（公告）日：1995-08-16

  A process for the production of an aromatic polycarbonate, which comprises polycondensing an aromatic dihydroxy compound and a diaryl carbonate in the presence, as a polycondensation catalyst, of at least one alkali metal salt selected from the group consisting of alkali metal salts of ate-complexes of a metal element, which is silicon, germanium, stannum or plumbum, and alkali metal salts of oxoacids of said metal elements. The above aromatic polycarbonate is almost free from being colored, is also almost free from a decrease in polymerization degree when molded, and is further almost free from forming branches and insolubles.

  一种芳香族聚碳酸酯的生产工艺，包括在至少一种碱金属盐作为缩聚催化剂的存在下，将芳香族二羟基化合物和碳酸二芳基酯进行缩聚，该碱金属盐选自金属元素（硅、锗、锡或铂）的吃络合物的碱金属盐和上述金属元素的氧化物的碱金属盐组成的组。上述芳香族聚碳酸酯几乎不着色，成型时聚合度也几乎不会降低，而且几乎不会形成分支和不溶物。
• THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3657254A1

  公开（公告）日：2020-05-27

  The present invention is a thermosetting silicon-containing material containing one or more of a repeating unit shown by the following general formula (Sx-1), a repeating unit shown by the following general formula (Sx-2), and a partial structure shown by the following general formula (Sx-3): where R1 represents an iodine-containing organic group; and R2 and R3 are each independently identical to R1, a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms. This provides: a thermosetting silicon-containing material used for forming a resist underlayer film which is capable of contributing to sensitivity enhancement of an upper layer resist while keeping LWR thereof from degrading; a composition for forming a silicon-containing resist underlayer film, the composition containing the thermosetting silicon-containing material; and a patterning process using the composition.

  本发明是一种热固性含硅材料，它含有一个或多个如下通式（Sx-1）所示的重复单元、如下通式（Sx-2）所示的重复单元和如下通式（Sx-3）所示的部分结构： 其中 R1 代表含碘有机基团；R2 和 R3 各自独立地与 R1、氢原子或具有 1 至 30 个碳原子的一价有机基团相同。本发明提供了：一种用于形成抗蚀剂底层薄膜的含硅热固性材料，该材料能够有助于提高上层抗蚀剂的灵敏度，同时使其低功耗不降低；一种用于形成含硅抗蚀剂底层薄膜的组合物，该组合物含有该含硅热固性材料；以及一种使用该组合物的图案化工艺。
• THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3680275A1

  公开（公告）日：2020-07-15

  A thermosetting silicon-containing compound contains one or more of structural units shown by the following general formulae (Sx-1), (Sx-2), and (Sx-3): where R1 represents a monovalent organic group containing both a phenyl group optionally having a substituent and a non-aromatic ring having 3 to 10 carbon atoms; and R2, R3 each represent the R1 or a monovalent organic group having 1 to 30 carbon atoms. Thus, the present invention provides a thermosetting silicon-containing compound usable in a silicon-containing resist underlayer film material capable of achieving contradictory properties of having both alkaline developer resistance and improved solubility in an alkaline stripping liquid containing no hydrogen peroxide.

  热固性含硅化合物包含一个或多个结构单元，结构单元的通式如下（Sx-1）、（Sx-2）和（Sx-3）： 其中，R1 代表一个一价有机基团，该基团包含一个可选具有取代基的苯基和一个具有 3 至 10 个碳原子的非芳香环；R2、R3 分别代表 R1 或一个具有 1 至 30 个碳原子的一价有机基团。因此，本发明提供了一种可用于含硅抗蚀剂底层薄膜材料的热固性含硅化合物，该化合物能够实现既具有抗碱性显影剂性能又能在不含过氧化氢的碱性剥离液中提高溶解性的矛盾特性。