申请人:Sumitomo Chemical Company, Limited
公开号:EP1067103A2
公开(公告)日:2001-01-10
The present invention provides a process for producing halogenated benzene compounds. In the process, an organometallic compound represented by the general formula [I]:
wherein M represents an R13Sn group, an R13Si group, an R13Ge group, an (R2CO2)Hg group, a ClHg group or an (R3O)2B group wherein each R1 independently represents a C1 - C8 alkyl group, R2 represents a C1 - C3 alkyl group or a C1 - C3 haloalkyl group, R3 represents a hydrogen atom or a C1 - C3 alkyl group, n represents an integer of from 0 to 4, m represents an integer of from 0 to 1, each A independently represents a fluorine atom, a nitro group, a cyano group, a C1 - C8 alkyl group, a C1 - C8 alkoxy group or a C2 - C8 acyloxy group, and Q represents an organic residue, is reacted in a solvent with a halide ion represented by the general formula X-, under light irradiation conditions in the presence of a semiconductor catalyst with a photocatalytic activity.
本发明提供了一种生产卤代苯化合物的工艺。在该工艺中,由通式[I]代表的有机金属化合物:
其中 M 代表 R13Sn 基团、R13Si 基团、R13Ge 基团、(R2CO2)Hg 基团、ClHg 基团或 (R3O)2B 基团 其中每个 R1 独立地代表 C1 - C8 烷基,R2 代表 C1 - C3 烷基或 C1 - C3 卤代烷基,R3 代表氢原子或 C1 - C3 烷基,n 代表 0 至 4 的整数,m 代表 0 至 1 的整数、每个 A 独立地代表氟原子、硝基、氰基、C1 - C8 烷基、C1 - C8 烷氧基或 C2 - C8 乙酰氧基,Q 代表有机残留物,在具有光催化活性的半导体催化剂存在下,在光照射条件下,在溶剂中与通式 X- 所代表的卤离子反应。