申请人:Agfa-Gevaert, N.V.
公开号:US04113734A1
公开(公告)日:1978-09-12
Masked isocyanates in which the isocyanate group or groups may be generated by heating above 100.degree. C are formed by tetrazolinones and bis(tetrazolinones) corresponding to the formula : ##STR1## wherein X is hydrogen, halogen, nitro, alkyl (1-4 C) or a group of formula: ##STR2## and R is an aliphatic, aromatic or araliphatic hydrocarbon radical. The bis(tetrazolinones) may be utilized to crosslink upon heating polymers containing active hydrogen atoms. The heating may occur image-wise or record-wise so that layers composed of mixtures of polymers and bis(tetrazolinones) can be used as heat-sensitive recording materials.
掩蔽型异氰酸酯是通过四唑酮和对应的双(四唑酮)形成的,其中异氰酸酯基或基团可通过加热至100℃以上来生成,其化学式为:其中X为氢、卤素、硝基、烷基(1-4C)或式:R为脂肪族、芳香族或芳基脂肪族烃基。双(四唑酮)可用于交联含有活性氢原子的聚合物。加热可以以图像方式或记录方式进行,以便由聚合物和双(四唑酮)混合物组成的层可用作热敏记录材料。