The invention provides a composition for coating a resist pattern and reversing the pattern by utilizing a difference in etching rates. A composition for applying to a resist pattern includes a component (A) which is at least one compound selected from the group consisting of a metal oxide (a1), a polyacid (a2), a polyacid salt (a3), a hydrolyzable silane (a4), a hydrolysis product (a5) of the hydrolyzable silane, and a hydrolysis condensate (a6) of the hydrolyzable silane; and a component (B), which is an aqueous solvent, in which the hydrolyzable silane (a4) is (i) a hydrolyzable silane containing an organic group having an amino group, (ii) a hydrolyzable silane containing an organic group having an ionic functional group, (iii) a hydrolyzable silane containing an organic group having hydroxy group, or (iv) a hydrolyzable silane containing an organic group having a functional group convertible to hydroxy group.
本发明提供了一种用于涂覆抗蚀剂图案并利用蚀刻率差异反转图案的组合物。一种用于涂覆抗蚀剂图案的组合物包括一种组分(A),它是至少一种选自由金属氧化物(a1)、多酸(a2)、多酸盐(a3)、可
水解
硅烷(a4)、可
水解
硅烷的
水解产物(a5)和可
水解
硅烷的
水解缩合物(a6)组成的组的化合物;和组分 (B),它是一种
水性溶剂,其中可
水解
硅烷 (a4) 是 (i) 含有
氨基的有机基团的可
水解
硅烷,(ii) 含有离子官能团的有机基团的可
水解
硅烷,(iii) 含有羟基的有机基团的可
水解
硅烷,或 (iv) 含有可转换为羟基的官能团的有机基团的可
水解
硅烷。