Dimethyl-α-tetralylcarbinol | 93429-64-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 四氢化萘
• 英文名称: Dimethyl-α-tetralylcarbinol
• 英文别名: 1-(α-oxy-isopropyl)-1.2.3.4-tetrahydro-naphthalene；1-(α-Oxy-isopropyl)-1.2.3.4-tetrahydro-naphthalin；2-(1,2,3,4-Tetrahydronaphthalen-1-yl)propan-2-ol
• CAS: 93429-64-2
• 化学式: C₁₃H₁₈O
• 分子量: 190.285
• InChiKey: JTRTUCDWBPBUOC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.54
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  Dimethyl-α-tetralylcarbinol 在 potassium pyrosulfate 作用下， 生成 1-(prop-1-en-2-yl)-1,2,3,4-tetrahydronaphthalene
  参考文献：
  名称：

  Kay; Morton, Journal of the Chemical Society, 1914, vol. 105, p. 1582

  摘要：

  DOI：
• 作为产物：
  描述：

  甲基碘化镁 、 alkaline earth salt of/the/ methylsulfuric acid 在 乙醚 作用下， 生成 Dimethyl-α-tetralylcarbinol
  参考文献：
  名称：

  Kay; Morton, Journal of the Chemical Society, 1914, vol. 105, p. 1582

  摘要：

  DOI：

文献信息

• PHOSPHOROUS PROTECTING GROUPS AND METHODS OF PREPARATION AND USE THEREOF
  申请人：Agilent Technologies, Inc.

  公开号：US20150315227A1

  公开（公告）日：2015-11-05

  Aspects of the present disclosure include compositions that make use of phosphorus and/or nucleobase protecting groups which find use in the synthesis of long polynucleotides. Phosphorus protecting groups are provided that help increase the stepwise coupling yield and/or phosphorous protecting groups that can be removed during the oxidation step. Amidine nucleobase protecting groups are provided that find use in the subject compositions and methods which provides for e.g., increased resistance to depurination during polynucleotide synthesis. In some instances, the methods and compositions disclosed herein utilize a combination of the phosphorus and amidine nucleobase protecting groups in the synthesis of polynucleotides having a sequence of 200 or more monomeric units in length. Also provided are methods for synthesizing a polynucleotide (e.g., a DNA) using one or more compounds disclosed herein.

  本公开涉及的方面包括使用磷和/或核碱基保护基的组合物，这些组合物用于合成长的多核苷酸。提供了磷保护基，有助于增加逐步耦合产率和/或可以在氧化步骤中去除的磷保护基。提供了酰胺核碱基保护基，用于本主题的组合物和方法，例如在多核苷酸合成过程中提供了增加的去嘌呤作用的抵抗力。在某些情况下，本公开的方法和组合物利用磷和酰胺核碱基保护基的组合合成具有200个或更多单体单位长度序列的多核苷酸。还提供了使用本文所述的一种或多种化合物合成多核苷酸（例如DNA）的方法。
• Phosphorous protecting groups and methods of preparation and use thereof
  申请人：Agilent Technologies, Inc.

  公开号：US10196418B2

  公开（公告）日：2019-02-05

  Aspects of the present disclosure include compositions that make use of phosphorus and/or nucleobase protecting groups which find use in the synthesis of long polynucleotides. Phosphorus protecting groups are provided that help increase the stepwise coupling yield and/or phosphorous protecting groups that can be removed during the oxidation step. Amidine nucleobase protecting groups are provided that find use in the subject compositions and methods which provides for e.g., increased resistance to depurination during polynucleotide synthesis. In some instances, the methods and compositions disclosed herein utilize a combination of the phosphorus and amidine nucleobase protecting groups in the synthesis of polynucleotides having a sequence of 200 or more monomeric units in length. Also provided are methods for synthesizing a polynucleotide (e.g., a DNA) using one or more compounds disclosed herein.

  本公开的各个方面包括利用磷和/或核碱基保护基团的组合物，这些组合物可用于长多核苷酸的合成。所提供的磷保护基团有助于提高分步偶联产率和/或在氧化步骤中可去除的磷保护基团。脒基核碱基保护基团可用于相关组合物和方法中，从而提高多核苷酸合成过程中的抗去嘌呤能力。在某些情况下，本文公开的方法和组合物在合成长度为 200 个或更多单体单元序列的多核苷酸时使用磷和脒核碱基保护基团的组合。此外，还提供了使用本文公开的一种或多种化合物合成多核苷酸（如 DNA）的方法。
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20130084529A1

  公开（公告）日：2013-04-04

  A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1), (2) or (3) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R 1 , R 2 , R 5 , R 6 , R 8 , and R 9 are alkyl, aryl, or alkenyl, R 3 , R 4 , R 7 , R 10 , and R 11 are hydrogen, alkyl, alkoxy, acyloxy, halogen, cyano, nitro, hydroxyl or trifluoromethyl, M is methylene or ethylene, R is a single bond or linking group.
• US8574817B2
  申请人：——

  公开号：US8574817B2

  公开（公告）日：2013-11-05
• Kay; Morton, Journal of the Chemical Society, 1914, vol. 105, p. 1582
  作者：Kay、Morton

  DOI：——

  日期：——