Troika Acid Semiconductor Cleaning Compositions and Methods of Use
申请人:LEE WAI MUN
公开号:US20110094536A1
公开(公告)日:2011-04-28
Semiconductor processing compositions for use with silicon wafers having an insulating layers, and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as a, α-disubstituted trifunctional oximes or α-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.
Trioka Acid Semiconductor Cleaning Compositions and Methods of Use
申请人:LEE WAI MUN
公开号:US20110180747A1
公开(公告)日:2011-07-28
Semiconductor processing compositions for use with silicon wafers having an insulating layers and metalization layers on the wafers comprising water and one or more Troika acids which is also referred to as α,α-disubstituted trifunctional oximes or α-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.