申请人:Hoechst-Roussel Pharmaceuticals Incorporated
公开号:US05229388A1
公开(公告)日:1993-07-20
There are disclosed compounds of the formula, ##STR1## where n is 0, 1 or 2; A is ##STR2## where X in each occurrence is independently hydrogen, halogen, loweralkyl, hydroxy, nitro, loweralkoxy, amino, cyano, trifluoromethyl or methylthio; Y in each occurrence is independently hydrogen, halogen, loweralkyl, hydroxy, nitro, loweralkoxy, amino, cyano, trifluoromethyl or methylthio; m is 1 or 2; k is 1 or 2; R.sub.1 and R.sub.2 are independently hydrogen, loweralkyl, ##STR3## or aryl except that when R.sub.1 is ##STR4## or aryl, R.sub.2 is hydrogen, or alternatively R.sub.1 +R.sub.2 taken together with the carbon atom to which they are attached form a cyclopentane, cyclohexane, cycloheptane, pyran, thiopyran, indan or piperidine ring; R.sub.3 and R.sub.4 are independently hydrogen or loweralkyl, or alternatively R.sub.3 +R.sub.4 taken together with the carbon atom to which they are attached form a cyclopentane, cyclohexane, cycloheptane, pyran, thiopyran, pyrrolidine or piperidine ring, the term aryl signifying an unsubstituted phenyl group or a phenyl group substituted with 1, 2 or 3 substituents each of which being independently loweralkyl, loweralkoxy, hydroxy, halogen, loweralkylthio, cyano, amino or trifluoromethyl, which are useful as antipsychotic, analgesic, anticonvulsant and anxiolytic agents.
公开了化合物的结构式,其中n为0、1或2;A为##STR2##其中每次出现的X独立地为氢、卤素、低碳基、羟基、硝基、低碳氧基、氨基、氰基、三氟甲基或甲硫基;每次出现的Y独立地为氢、卤素、低碳基、羟基、硝基、低碳氧基、氨基、氰基、三氟甲基或甲硫基;m为1或2;k为1或2;R.sub.1和R.sub.2独立地为氢、低碳基、##STR3##或芳基,但当R.sub.1为##STR4##或芳基时,R.sub.2为氢,或者R.sub.1+R.sub.2与它们所附着的碳原子结合形成环戊烷、环己烷、环庚烷、吡喃、硫代吡喃、茚烷或哌啶环;R.sub.3和R.sub.4独立地为氢或低碳基,或者R.sub.3+R.sub.4与它们所附着的碳原子结合形成环戊烷、环己烷、环庚烷、吡喃、硫代吡喃、吡咯烷或哌啶环,术语芳基表示未取代的苯基或取代有1、2或3个取代基的苯基,每个取代基独立地为低碳基、低碳氧基、羟基、卤素、低碳硫基、氰基、氨基或三氟甲基,这些化合物可用作抗精神病、镇痛、抗癫痫和抗焦虑剂。