N-Ethyl-N'-n-butyl-hydrazin | 3711-26-0

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N-Ethyl-N'-n-butyl-hydrazin
• 英文别名: 1-Ethyl-2-butyl-hydrazin；1-Butyl-2-ethylhydrazin；butylaminoethylamine；1-Butyl-2-ethylhydrazine
• CAS: 3711-26-0
• 化学式: C₆H₁₆N₂
• 分子量: 116.206
• InChiKey: ALNDIBLAORBEAX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  8
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  24.1
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  N-Ethyl-N'-n-butyl-hydrazin 在 mercury(II) oxide 作用下， 以 水 为溶剂， 生成 Ethylazo-butan
  参考文献：
  名称：

  Synthesis of Unsymmetrical Azoalkanes from Acylalkylhydrazones and 1,2-Dialkylhydrazines¹

  摘要：

  DOI：

  10.1021/jo01021a004
• 作为产物：
  描述：

  1-Acetyl-2-butyliden-hydrazin 在 lithium aluminium tetrahydride 作用下， 以 乙醚 为溶剂， 生成 N-Ethyl-N'-n-butyl-hydrazin
  参考文献：
  名称：

  Synthesis of Unsymmetrical Azoalkanes from Acylalkylhydrazones and 1,2-Dialkylhydrazines¹

  摘要：

  DOI：

  10.1021/jo01021a004

文献信息

• METHOD OF PRODUCING ORGANOSILICON COMPOUND
  申请人：NOBE Youhei

  公开号：US20090299086A1

  公开（公告）日：2009-12-03

  A method of producing an organosilicon compound includes substituting at least an OR 1 group of a compound shown by the following general formula (1) to obtain a compound shown by the following general formula (2), Si(OR 1 ) 3-m Y 1 m —R 2 —Si(OR 3 ) 3-n Y 2 n (1) Si(OR 4 ) 3-m Y 1 m —R 2 —Si(OR 4 ) 3-n Y 2 n (2).

  生产有机硅化合物的方法包括将以下一般式（1）所示的化合物中的至少一个OR1基团替换为以获得以下一般式（2）所示的化合物，Si(OR1)3-mY1m—R2—Si(OR3)3-nY2n(1)Si(OR4)3-mY1m—R2—Si(OR4)3-nY2n(2)。
• Composition for film formation, method of film formation, and insulating film
  申请人：JSR Corporation

  公开号：EP1088868A2

  公开（公告）日：2001-04-04

  A polyorganosiloxane-based composition for film formation which gives a film having low dielectric constant and high modulus of elasticity and useful as an interlayer insulating film in semiconductor devices and the like. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an alkali catalyst, at least one member selected from the group consisting of compounds (1) represented by RaSi(OR1)4-a (wherein R represents hydrogen, fluorine, or a monovalent organic group; R1 represents a monovalent organic group; and a Is an integer of 1 or 2), compounds (2) represented by Si(OR2)4 (wherein R2 represents a monovalent organic group), and compounds (3) represented by R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c [wherein R3 to R6 may be the same or different and each represent a monovalent organic group; b and c may be the same or different and each are an integer of 0 to 2; R7 represents oxygen, phenylene, or a group represented by -(CH2)n-, wherein n is an integer of 1 to 6; and d is 0 or 1]; and (B) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of a metal chelate compound catalyst, at least one member selected from the group consisting of the compounds (1), (2), and (3).

  一种用于成膜的聚有机硅氧烷基组合物，可生成具有低介电常数和高弹性模量的薄膜，可用作半导体器件等的层间绝缘膜。 成膜组合物包括(A) 通过在碱催化剂存在下水解和缩合得到的水解和缩合产物，该产物至少有一个成员选 自由 RaSi(OR1)4-a（其中 R 代表氢、氟或一价有机基团；R1 代表一价有机基团；且 a 是 1 或 2 的整数）、由 Si(OR2)4（其中 R2 代表一价有机基团）代表的化合物 (2) 以及由 R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c 代表的化合物 (3) [其中 R3 至 R6 可以相同或不同，且各自代表一价有机基团；b和c可以相同或不同，且各自为0至2的整数；R7代表氧、亚苯基或由-(CH2)n-代表的基团，其中n为1至6的整数；d为0或1]；以及 (B) 在金属螯合物催化剂存在下，通过水解和缩合得到的至少一种水解和缩合产物，该产物选自由化合物(1)、(2)和(3)组成的组。
• Composition for film formation, method of film formation, and silica-based film
  申请人：JSR Corporation

  公开号：EP1127929A2

  公开（公告）日：2001-08-29

  A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.

  一种用于成膜的组合物，该组合物能够生成具有超低介电常数和更高机械强度的硅基涂膜，并可用作半导体器件等的层间绝缘膜；一种生产该组合物的工艺；以及一种由该组合物生成的硅基涂膜。该组合物包括 (A) 通过水解和缩合一种或多种硅烷化合物而得到的水解和缩合产物，以及 (B) 有机溶剂。
• Oil soluble organic molybdenum complexes and their use as multifunctional additives for lubricating compositions
  申请人：ETHYL CORPORATION

  公开号：EP1136496A1

  公开（公告）日：2001-09-26

  Organic molybdenum complexes comprising the reaction products of fatty oils, a mono-alkylated alkylene diamine, and a molybdenum source and their use as multifunctional additives for lubricating compositions.

  由脂肪油、单烷基化亚烷基二胺和钼源的反应产物组成的有机钼络合物及其作为润滑组合物多功能添加剂的用途。
• Oil soluble molybdenum-containing compositions
  申请人：ETHYL CORPORATION

  公开号：EP1136497A1

  公开（公告）日：2001-09-26

  Organic molybdenum complexes comprising the reaction products of a long-chain monocarboxylic acid, a mono-alkylated alkylene diamine, glycerides, and a molybdenum source and their use as multifunctional additives for lubricating compositions.

  由长链单羧酸、单烷基化亚烷基二胺、甘油酯和钼源的反应产物组成的有机钼络合物及其作为润滑组合物多功能添加剂的用途。