1.1-Bis-(4-hydroxy-phenyl)-2-oxo-acenaphthen | 23916-52-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1.1-Bis-(4-hydroxy-phenyl)-2-oxo-acenaphthen
• 英文别名: 2,2-bis-(4-hydroxy-phenyl)-acenaphthen-1-one；2,2-Bis-(4-hydroxy-phenyl)-acenaphthen-1-on；1,1-bis(4-hydroxyphenyl)acenaphthene-2-one；2-Bis-(4'-hydroxyphenyl)acenaphthenone；2,2-bis(4-hydroxyphenyl)acenaphthylen-1-one
• CAS: 23916-52-1
• 化学式: C₂₄H₁₆O₃
• 分子量: 352.389
• InChiKey: DSKWDYVXPQVWRU-UHFFFAOYSA-N

物化性质

• 熔点：
  240-241 °C
• 沸点：
  581.4±50.0 °C(Predicted)
• 密度：
  1.381±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  27
• 可旋转键数：
  2
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.04
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  对硝基甲苯 、 1.1-Bis-(4-hydroxy-phenyl)-2-oxo-acenaphthen 、 alkaline earth salt of/the/ methylsulfuric acid 生成 8-(4,4',α-trihydroxy-benzhydryl)-[1]naphthoic acid
  参考文献：
  名称：

  Matei; Bogdan, Chemische Berichte, 1938, vol. 71, p. 2292,2295

  摘要：

  DOI：
• 作为产物：
  描述：

  苊醌 生成 1.1-Bis-(4-hydroxy-phenyl)-2-oxo-acenaphthen
  参考文献：
  名称：

  EP1666970

  摘要：

  公开号：

文献信息

• Method of manufacturing a semiconductor device
  申请人：Oguro Dai

  公开号：US20070059632A1

  公开（公告）日：2007-03-15

  The compound of the present invention is represented by the following formula 1: wherein R 1 , R 2 , R 4 , R 5 , m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent.

  本发明的化合物由以下的公式1表示：其中，R1、R2、R4、R5、m0至m2和n0至n2的定义如描述中所述。含有公式1化合物作为固体组分主要成分的辐射敏感组合物在敏感性、分辨率、耐热性、耐蚀性和溶解度方面表现出色。
• COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP1666970A1

  公开（公告）日：2006-06-07

  The compound of the present invention is represented by the following formula 1: wherein R1, R2, R4, R5, m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent.

  本发明的化合物由下式 1 表示： 其中 R1、R2、R4、R5、m0 至 m2 和 n0 至 n2 如说明中所定义。含有式 1 所示化合物作为固体组分主要成分的辐射敏感性组合物在敏感性、分辨率、耐热性、抗蚀刻性和溶剂溶解性方面都非常出色。
• Campbell; Chattaway, Proceedings of the Royal Society of London. Series B, Biological sciences, 1942, vol. 130, p. 435,447
  作者：Campbell、Chattaway

  DOI：——

  日期：——
• Matei, Chemische Berichte, 1929, vol. 62, p. 2097
  作者：Matei

  DOI：——

  日期：——
• Resist composition
  申请人：Echigo Masatoshi

  公开号：US20080153031A1

  公开（公告）日：2008-06-26

  A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C 5-45 aromatic ketone or aromatic aldehyde with a C 6-15 compound having from 1 to 3 phenolic hydroxyl groups, and, (b) its molecular weight is form 300 to 5000. The radiation-sensitive composition is solvent-soluble and exhibits a high sensitivity, high resolution, and high heat resistance.