申请人:Fuji Photo Film Co., Ltd.
公开号:US04701399A1
公开(公告)日:1987-10-20
A photosensitive composition containing a 2-halomethyl-5-substituted-1,3,4-oxadiazole compound represented by the following general formula (I): ##STR1## wherein A represents a substituted or unsubstituted aromatic residue; X represents a hydrogen atom, a cyano group, an alkyl group or an aryl group; Y represents a chlorine atom or a bromine atom; and n represents an integer of 1 to 3. The free radical generating agent represented by the general formula (I) has a photosensitive wavelength range from near ultraviolet range to visible range, high photo-decomposition sensitivity and good compatibility with other components present in the photosensitive composition. The photosensitive composition is suitable for use in light-sensitive printing plates or photo-resists.
一种光敏组合物,包含以下通式(I)所代表的2-卤代甲基-5-取代-1,3,4-噁二唑化合物:
其中,A代表取代或未取代的芳香基团;X代表氢原子、氰基、烷基或芳基;Y代表氯原子或溴原子;n代表1至3的整数。通式(I)所代表的自由基产生剂具有从近紫外范围到可见范围的光敏波长范围,高光分解敏感性,并且与光敏组合物中存在的其他成分具有良好的相容性。该光敏组合物适用于光敏印刷版或光阻材料。