Compounds of the formula
wherein M is either (1) a metal ion having a positive charge of +y wherein y is an integer which is at least 2, said metal ion being capable of forming a compound with at least two
chromogen moieties, or (2) a metal-containing moiety capable of forming a compound with at least two
chromogen moieties, z is an integer representing the number of
chromogen moieties associated with the metal and is at least 2, R
1
, R
2
, R
3
, R
4
, R
5
, R
6
, R
7
, a, b, c, d, Y, and z are as defined herein, Q
−
is a COO
−
group or a SO
3
— group, A is an organic anion, and CA is either a hydrogen atom or a cation associated with all but one of the Q
−
groups.
Phosphonic acid derivatives useful as anti-inflammatory agents
申请人:THE UPJOHN COMPANY
公开号:EP0622373A1
公开(公告)日:1994-11-02
Novel 1,2-oxaphosphepins are useful as antiinflammatory and antiarthritic agents. A representative oxaphosphepin is 3,4-dihydro-3-methoxy-7-(phenylmethoxy)-1H-naphth[1,8de][1,2]oxaphosphepin-3-oxide.
MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20170008982A1
公开(公告)日:2017-01-12
A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.
Frontier molecular orbital analysis of dual fluorescent dyes: predicting two-color emission in N-Aryl -1,8-naphthalimides
作者:Premchendar Nandhikonda、Michael P. Begaye、Zhi Cao、Michael D. Heagy
DOI:10.1039/c001912g
日期:——
A 3 × 3 matrix of disubstituted N-aryl-1,8-naphthalimides was synthesized for the evaluation and discovery of dual fluorescence (DF). The matrix elements included for this study were based on a predictive model that is proposed as a seesaw balanced photophysical model. This model serves as a guide to optimize the dual fluorescence emission from N-phenyl-1,8-naphthalimdes by appropriate placement of substituent groups at both the 4-position of the N-arene as well as the 4′-position of the naphthalene ring. Steady-state fluorescence studies under a variety of solvents indicate that four of the nine dyes in the matrix are dual fluorescent. To provide a more quantitative description of the model, cyclic voltammetry experiments were used to calculate HOMO/LUMO energies of the aromatic components that comprise these DF dyes and give evidence in support for potential mixing of S1 and S2 excited states. Given the difficulties in predicting excited state properties such as molecular fluorescence, this ratio of four out of nine “hits’ for discovering DF signifies proof of principle for this proposed model and should provide a rational basis for the synthesis of future DF 1,8-naphthalimide systems.
SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20220107560A1
公开(公告)日:2022-04-07
A sulfonium salt having formula (1) is novel. A chemically amplified resist composition comprising the sulfonium salt as a PAG has advantages including solvent solubility and improved lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV.