申请人:Ishihara Masami
公开号:US20050233253A1
公开(公告)日:2005-10-20
The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides “a heterocycle-containing onium salt shown by the general formula [1]:
[wherein R is a group shown by the general formula [2]:
(wherein R
3
and R
4
are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X
2
is an oxygen atom or a sulfur atom; i is an integer of 0 to 4; and j is an integer of 0 to 3), or a group shown by the general formula [3]:
(wherein R
5
and R
6
are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X
3
and X
4
are each independently an oxygen atom or a sulfur atom; p is an integer of 0 to 2; and q is an integer of 0 to 3); R
1
and R
2
are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; m and n are each independently an integer of 0 to 5; and A is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]:
HM
1
(R
7
)
4
[4]
(wherein M
1
is a boron atom or a gallium atom; and R
7
is an aryl group which may have a substituent selected from a lower haloalkyl group, a halogen atom, a nitro group and a cyano group)]” or “a heterocycle-containing onium salt shown by the general formula [35]:
[wherein R
26
and R
27
are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2], or a group shown by the above-mentioned general formula [3]; and A
3
is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]; and provided that at least one of R
26
and R
27
is a group shown by the above-mentioned general formula [2] or [3], and when only one of R
26
and R
27
is a group shown by the above-mentioned general formula [2] or [3], A
3
is an anion derived from an inorganic strong acid shown by the general formula [36];
HM
3
F
6
[36]
(wherein M
3
is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4]]”.
本发明涉及一种含杂环离子盐,例如,用作阳离子光聚合引发剂和化学增感抗蚀剂的酸发生剂,并提供“一种由通式[1]所示的含杂环离子盐:[其中R是由通式[2]所示的基团:(其中R3和R4分别独立地是卤素原子,可能具有卤素原子或芳基取代基的烷基基团,或可能具有卤素原子或较低烷基基团的芳基基团;X2是氧原子或硫原子;i是0到4的整数;j是0到3的整数),或由通式[3]所示的基团:(其中R5和R6分别独立地是卤素原子,可能具有卤素原子或芳基取代基的烷基基团,或可能具有卤素原子或较低烷基基团的芳基基团;X3和X4分别独立地是氧原子或硫原子;p是0到2的整数;q是0到3的整数);R1和R2分别独立地是卤素原子,可能具有卤素原子或芳基取代基的烷基基团,或可能具有卤素原子或较低烷基基团的芳基基团;m和n分别独立地是0到5的整数;A是从无机强酸,有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子:HM1(R7)4[4](其中M1是硼原子或镓原子;R7是可能选择自较低卤代烷基基团、卤素原子、硝基基团和氰基团的芳基基团)]”或“一种由通式[35]所示的含杂环离子盐:[其中R26和R27分别独立地是可能具有卤素原子或较低烷基基团的芳基基团,上述通式[2]所示的基团或上述通式[3]所示的基团;A3是从无机强酸,有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子;并且至少其中之一的R26和R27是上述通式[2]或[3]所示的基团,当仅R26和R27中的一个是上述通式[2]或[3]所示的基团时,A3是从通式[36]所示的无机强酸得到的阴离子:HM3F6[36](其中M3是磷原子、砷原子或锑原子),有机酸或由通式[4]所示的化合物]”。