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(E)-1-(2'-Hydroxy-5'-nonylphenyl)-1-ethanone oxime | 93913-80-5

中文名称
——
中文别名
——
英文名称
(E)-1-(2'-Hydroxy-5'-nonylphenyl)-1-ethanone oxime
英文别名
2-[(E)-N-hydroxy-C-methylcarbonimidoyl]-4-nonylphenol
(E)-1-(2'-Hydroxy-5'-nonylphenyl)-1-ethanone oxime化学式
CAS
93913-80-5
化学式
C17H27NO2
mdl
——
分子量
277.407
InChiKey
JWLRQNQOJOZVOX-NBVRZTHBSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    6.1
  • 重原子数:
    20
  • 可旋转键数:
    9
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.59
  • 拓扑面积:
    52.8
  • 氢给体数:
    2
  • 氢受体数:
    3

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Mass spectra of 1-(2′-hydroxy-5′-alkylphenyl)-1-alkanone (E)-oximes
    作者:Marek Łozyński、Ewa Krzyzanowska
    DOI:10.1002/oms.1210210108
    日期:1986.1
    AbstractThe mass spectra of 1‐(2′‐hydroxy‐5′‐alkylphenyl)‐1‐ethanone (E)‐oximes 1–6 and 1‐(2′‐hydroxy‐5′‐methylphenyl)‐1‐alkanone (E)‐oximes 7–12 are given and the major fragmentation pathways discussed. The simultaneous loss of water and alkyl moieties from the molecular ion indicates that a skeletal rearrangement take place and a cycloheptatrienyloheterocyclic system is formed. The McLafferty rearrangement, γ‐fission in the side aliphatic chain and oxygen expulsion are discussed with evidence being drawn from accurate mass measurements, metastable ions and comparison with mass spectral data of related compounds.
  • Stripping Process
    申请人:Fujifilm Electronic Materials U.S.A., Inc.
    公开号:US20180136563A1
    公开(公告)日:2018-05-17
    This disclosure relates to a process for stripping an organic film on a patterned semiconductor substrate. The process includes treating the organic film with an aqueous stripper composition to remove the organic film in one step. The organic film includes at least a first layer and a second layer, the first layer has a dissolution rate of at most about 0.01 μ/min in a developer at 25° C., and the second layer has a dissolution rate of greater than about 0.01 μ/min in the developer at 25° C.
  • US8945490B2
    申请人:——
    公开号:US8945490B2
    公开(公告)日:2015-02-03
  • [EN] CLEANING COMPOSITION<br/>[FR] COMPOSITION DE NETTOYAGE
    申请人:FUJIFILM ELECTRONIC MAT USA INC
    公开号:WO2017023677A1
    公开(公告)日:2017-02-09
    This disclosure relates to a composition (e.g., a cleaning and/or stripping composition) containing (a) 0.5 - 25 percent by weight an alkaline compound; (b) 1 - 25 percent by weight an alcohol amine compound; (c) 0.1 - 20 percent by weight a hydroxylammonium compound; (d) 5 - 95 percent by weight an organic solvent; (e) 0.1 - 5 percent by weight a corrosion inhibitor compound; and (f) 2 -25 percent by weight water.
  • Krzyzanowska, Ewa; Olszanowski, A.; Juskowiak, M., Journal fur praktische Chemie (Leipzig 1954), 1989, vol. 331, # 4, p. 617 - 630
    作者:Krzyzanowska, Ewa、Olszanowski, A.、Juskowiak, M.
    DOI:——
    日期:——
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