全氟环已烷羧酸 | 374-88-9

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 中文名称: 全氟环已烷羧酸
• 中文别名: 十一氟环己烷羧酸
• 英文名称: 1,2,2,3,3,4,4,5,5,6,6-perfluorocyclohexanecarboxylic acid
• 英文别名: undecafluoro-cyclohexanecarboxylic acid；Undecafluor-cyclohexancarbonsaeure；Perfluor-cyclohexancarbonsaeure；Perfluorocyclohexanecarboxylic acid；1,2,2,3,3,4,4,5,5,6,6-undecafluorocyclohexane-1-carboxylic acid
• CAS: 374-88-9
• 化学式: C₇HF₁₁O₂
• 分子量: 326.066
• InChiKey: VTXSVMHCHVIRJR-UHFFFAOYSA-N

物化性质

• 沸点：
  168-170°C
• 密度：
  1.81±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  20
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  13

安全信息

• 危险等级：
  CORROSIVE
• 危险品标志：
  C
• 安全说明：
  S26,S36/37/39
• 危险类别码：
  R34
• 危险品运输编号：
  UN 3265

反应信息

• 作为反应物：
  描述：

  全氟环已烷羧酸 在 溴 、 甲烷 作用下， 生成 1-溴十一氟环己烷
  参考文献：
  名称：

  Making of rfbr from rfcooh

  摘要：

  公开号：

  US02647933A1
• 作为产物：
  描述：

  苯甲酸 在 氢氟酸 作用下， 生成 全氟环已烷羧酸
  参考文献：
  名称：

  全氟羧酸的一些性质

  摘要：

  DOI：

  10.1021/ie50502a044

文献信息

• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• Vinyl esters of perfluoro acids
  作者：Thomas S. Reid、Donald W. Codding、Frank A. Bovey

  DOI：10.1002/pol.1955.120188911

  日期：1955.11

  esters of perfluoro acids has been prepared by the mercury catalyzed reaction of the acids with acetylene. Certain physical properties of the monomers are given. Homopolymers gave clear, flexible films with the exception of vinyl caprylate and caprate, which formed waxy films. Copolymerization of vinyl perfluorobutyrate proceeded readily with vinyl acetate and methyl methacrylate, but less readily with

  已经通过酸与乙炔的汞催化反应制备了一系列七种全氟酸乙烯基酯。给出了单体的某些物理特性。除了辛酸乙烯酯和癸酸乙烯酯形成蜡状薄膜外，均聚物可产生透明、柔韧的薄膜。全氟丁酸乙烯酯与乙酸乙烯酯和甲基丙烯酸甲酯的共聚很容易进行，但与苯乙烯、马来酸酐和丙烯腈的共聚则较难进行。
• Fluorocarbon and hydrocarbon end groups: effects on mesomorphism and physical properties of smectic liquid crystals
  作者：Stephen J. Cowling、Alan W. Hall、John W. Goodby

  DOI：10.1039/c1jm11138h

  日期：——

  In this article we examine the effects of cyclohexane and perfluorocyclohexane being used as bulky end groups on the mesomorphism of classical smectic liquid crystal mesogens. The mesogen that is used in this work is typical of the MHPOBC family of materials. The mesophase behaviour is investigated and miscibility studies are carried out. Electro-optical evaluation of the materials is investigated to show the effect of the terminal group on physical properties such as spontaneous polarisation and tilt angle.

  在这篇文章中，我们研究了环己烷和全氟环己烷作为笨重端基对经典共晶液晶介质的介构的影响。这项研究中使用的介质是典型的 MHPOBC 系列材料。研究人员对介相行为进行了调查，并开展了混溶性研究。对材料的电光评估进行了研究，以显示终端基团对自发极化和倾斜角等物理性质的影响。
• Novel perfluoroalkyl vinyl ether compound, process for preparing copolymer by using the compound, and optical plastic materials comprising copolymer prepared by the process
  申请人：Hwang Taek Jin

  公开号：US20050148800A1

  公开（公告）日：2005-07-07

  Disclosed herein are a novel perfluoroalkyl vinyl ether compound, a process for preparing a copolymer by using the perfluoroalkyl vinyl ether compound, and an optical plastic material comprising a copolymer prepared by the process. More specifically, the perfluoroalkyl vinyl ether has a particular molecular structure; the process is performed by copolymerizing the perfluoroalkyl vinyl ether compound with a common fluorinated olefin in the presence of a perfluorinated radical initiator; and, the optical plastic material comprises a copolymer prepared by the process and optionally a dopant. The copolymerization of the perfluoroalkyl vinyl ether with a common fluorinated olefin can provide a copolymer having a high molecular weight. In addition, appropriate control of the composition of the monomers can provide a completely amorphous copolymer. Since the polymer prepared by the process exhibits excellent thermal properties and is substantially transparent in the UV and near IR regions, it can be usefully applied to various optical plastic materials. Furthermore, a preform for a GI type plastic optical fiber fabricated by using the copolymer and the dopant has a high T g , thus being stable, and a parabolic refractive index profile due to the presence of the dopant.

  本文披露了一种新型的全氟烷基乙烯醚化合物，一种利用该全氟烷基乙烯醚化合物制备共聚物的方法，以及一种包括通过该方法制备的共聚物的光学塑料材料。具体而言，该全氟烷基乙烯醚具有特定的分子结构；该方法是在全氟基自由基引发剂的存在下，通过共聚合该全氟烷基乙烯醚化合物和常见的氟化烯烃来进行的；而且，该光学塑料材料包括通过该方法制备的共聚物和可选的掺杂剂。 全氟烷基乙烯醚与常见的氟化烯烃的共聚可以提供高分子量的共聚物。此外，适当控制单体的组成可以提供完全无定形的共聚物。由于该方法制备的聚合物具有优异的热性能，并且在紫外线和近红外区域具有较高的透明度，因此可以应用于各种光学塑料材料中。此外，使用该共聚物和掺杂剂制备的GI型塑料光纤预制件具有高Tg，因此稳定，并且由于存在掺杂剂而具有抛物线折射率剖面。
• Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition
  申请人：Yamaguchi Shuhei

  公开号：US20120237874A1

  公开（公告）日：2012-09-20

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括以下任何一种化合物（A），该化合物在暴露于感光射线或辐射时会产生酸和树脂（B），其溶解速度在碱性显影剂的作用下会增加。 （通式（I）中使用的字符具有描述中提到的含义。）