An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 &mgr;m or smaller) features.
提供了一种改进的方法,用于在基底表面上应用有机抗反射涂层以及所得到的前体结构。广义上,该方法包括在基底表面上
化学气相沉积(CVD)抗反射化合物。在一种实施例中,该化合物高度拉伸(例如,具有至少约10 kcal/mol的应变能),并且由两个环状基团通过连桥基团相互连接。最优选的单体是[2.2](1,4)-
萘菲和[2.2](9,10)-
蒽菲。CVD过程包括加热抗反射化合物以使其蒸发,然后热解蒸发的化合物以形成稳定的二自由基,随后在沉积室中在基底表面上聚合。该创新方法适用于在具有超亚微米(0.25微米或更小)特征的大型基底表面上提供高度符合的抗反射涂层。