FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
申请人:JSR Corporation
公开号:EP2003148A2
公开(公告)日:2008-12-17
An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物,该组合物含有该含氟聚合物,可使图案具有极佳的形状和极佳的焦深、其中,在液浸光刻过程中,液浸光刻用液体(如水)中与光刻胶接触的被洗脱成分的量很少,而且光刻胶膜与液浸光刻用液体(如水)之间的后退接触角较大;以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式(1)和(2)表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物(A)、具有酸不稳定基团的树脂(B)、辐射敏感酸发生器(C)、含氮化合物(D)和溶剂(E)。