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1,2-萘二甲醇 | 39050-28-7

中文名称
1,2-萘二甲醇
中文别名
——
英文名称
1,2-Bis-hydroxymethyl-naphthalin
英文别名
[2-(Hydroxymethyl)naphthalen-1-yl]methanol;[1-(hydroxymethyl)naphthalen-2-yl]methanol
1,2-萘二甲醇化学式
CAS
39050-28-7
化学式
C12H12O2
mdl
MFCD28505869
分子量
188.226
InChiKey
HETNNUSMWLIANA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    126 °C
  • 沸点:
    400.9±25.0 °C(Predicted)
  • 密度:
    1.244±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.4
  • 重原子数:
    14
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.166
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Synthesis of 1,2-phenylenedimethanols by base-promoted reduction of isobenzofuran-1(3H)-ones with silane
    作者:Bin Liu、Xigeng Zhou
    DOI:10.1016/j.cclet.2018.11.025
    日期:2019.3
    Abstract An efficient method for preparation of substituted 1,2-phenylenedimethanols and aliphatic 1,4-diols that are valuable intermediates in organic synthesis, has been developed by the base-promoted reduction of isobenzofuran-1(3H)-ones and γ-lactones with silane under mild conditions. Compared with traditional procedures using stoichiometric amounts of metal hydrides and alkyl reductants, the
    摘要通过碱促进异苯并呋喃-1(3H)-酮和γ-内酯的还原反应,开发了一种有效的方法来制备取代的1,2-苯二甲醇和脂肪族的1,4-二醇,它们是有机合成中的重要中间体。与硅烷在温和的条件下。与使用化学计算量的氢化物和烷基还原剂的传统方法相比,本方法避免了使用敏感试剂,并且操作简单并且可以耐受多种官能团。
  • Modified Borohydride Agents, 1-Benzyl-4-aza-1-azoniabicyclo[2.2.2]octane Tetrahydroborate (BAAOTB) versus Tetrabutylammonium Tetrahydroborate (TBATB). Efficient, Selective, and Versatile Reducing Agents
    作者:Habib Firouzabadi、Gholam Reza Afsharifar
    DOI:10.1246/bcsj.68.2595
    日期:1995.9
    1-Benzyl-4-aza-1-azoniabicyclo[2.2.2]octane tetrahydroborate (BAAOTB) and tetrabutylammonium tetrahydroborate (TBATB) are used for the selective reductions of aldehydes, ketones, α,β-unsaturated carbonyl compounds, acid chlorides, azides, epoxides, and disulfides in t-BuOH and hexane/chloroform. ABBOAB with its rigid and bulky structure reacts more selectively than its analogue TBATB.
    1-Benzyl-4-aza-1-azoniabicyclo[2.2.2]辛烷四氢硼酸盐 (BAAOTB) 和四丁基四氢硼酸 (TBATB) 用于选择性还原醛、酮、α,β-不饱和羰基化合物、酰叠氮化物环氧化物和二硫化物在 t-BuOH 和己烷/氯仿中。ABBOAB 与它的类似物 TBATB 相比,具有刚性和庞大结构的反应更具选择性。
  • IDO/TDO Inhibitor
    申请人:GENERAL INCORPORATED ASSOCIATION PHARMA VALLEY PROJECT SUPPORTING ORGANIZATION
    公开号:US20200239452A1
    公开(公告)日:2020-07-30
    A compound of formula (I) given below or a pharmaceutically acceptable salt of the compound is useful as an IDO/TDO inhibitor. Thus, the compound of formula (I) or the pharmaceutically acceptable salt of the compound can be used as, for example, a therapeutic agent for a disease or a disorder selected from tumor, infectious disease, neurodegenerative disorder, cataract, organ transplant rejection, autoimmune disease, postoperative cognitive impairment, and disease related to women's reproductive health [in the following formula (I), ring A represents an aromatic ring, an aliphatic ring, a heterocyclic ring, or a condensed ring of two or more rings selected from an aromatic ring, an aliphatic ring and a heterocyclic ring; X, R 1 and R 2 represent a substituent on a ring atom constituting ring A; m represents an integer of 0 to 6; X represents, for example, a halogen atom; and R 1 and R 2 are the same or different and are selected from, for example, the group consisting of groups of formula (a) or formula (b); and in the following formula (a) and formula (b), Y is selected from the group consisting of O, S, and Se, Z is selected from the group consisting of O, S, and Se, n represents an integer of 1 to 8, r represents an integer of 1 to 8, s represents an integer of 1 to 8, R 4 represents, for example, —C(═NH)—HN 2 , and R 6 represents, for example, a substituted or unsubstituted aryl group].
    以下公式(I)给出的化合物或该化合物的药学上可接受的盐可用作IDO/TDO抑制剂。因此,公式(I)的化合物或该化合物的药学上可接受的盐可用作,例如,用于肿瘤、传染病、神经退行性疾病、白内障、器官移植排斥、自身免疫疾病、术后认知障碍以及与女性生殖健康相关的疾病的治疗剂。在以下公式(I)中,环A代表芳香环、脂环、杂环或两个或更多个选自芳香环、脂环和杂环的缩合环的环;X、R1和R2代表构成环A的环原子上的取代基;m代表0到6的整数;X代表例如卤素原子;R1和R2相同或不同,选自例如由公式(a)或公式(b)组成的基团,而在以下公式(a)和公式(b)中,Y选自O、S和Se组成的基团,Z选自O、S和Se组成的基团,n表示1到8的整数,r表示1到8的整数,s表示1到8的整数,R4代表例如—C(═NH)—HN2,R6代表例如取代或未取代的芳基。
  • Compound for Resist and Radiation-Sensitive Composition
    申请人:Echigo Masatoshi
    公开号:US20080113294A1
    公开(公告)日:2008-05-15
    A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
    一种辐射敏感的组合物,包含1至80重量%的固体组分和20至99重量%的溶剂。固体组分包含化合物B,其具有(a)通过向多化合物A的至少一个羟基引入酸解离基而导出的结构,多化合物A通过二元至四元芳香酮或芳香醛的缩合反应,每个具有5至36个碳原子的化合物与具有1至3个羟基和6至15个碳原子的化合物结合,并且(b)分子量为400至2000。含有化合物B的组合物非常敏感于辐射,例如KrF准分子激光器,极紫外线,电子束和X射线,并且提供具有高分辨率,高耐热性和高蚀刻抗性的抗阻图案,因此可用作酸放大的非聚合物抗阻材料。
  • COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
    申请人:ECHIGO Masatoshi
    公开号:US20110165516A1
    公开(公告)日:2011-07-07
    A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
    一种辐射敏感组合物,含有1-80重量%的固体组分和20-99重量%的溶剂。固体组分包含化合物B,其具有(a)从多化合物A导出的结构,通过在多化合物A的至少一个羟基上引入酸解离基团而合成,多化合物A是由具有5至36个碳原子的二元至四元芳香酮或芳香醛与具有1至3个羟基和6至15个碳原子的化合物之间的缩合反应合成的;(b)分子量为400至2000。含有化合物B的组合物可用作酸放大,非聚合物抗蚀材料,因为它对KrF准分子激光、极紫外线、电子束和X射线等辐射非常敏感,并提供具有高分辨率、高耐热性和高蚀刻抗性的抗蚀图案。
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