Bis[3-(dimethylamino)phenyl]-(4-methoxyphenyl)methanol | 1310450-07-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: Bis[3-(dimethylamino)phenyl]-(4-methoxyphenyl)methanol
• CAS: 1310450-07-7
• 化学式: C₂₄H₂₈N₂O₂
• 分子量: 376.499
• InChiKey: ZSENATJTIHLQPQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  28
• 可旋转键数：
  6
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  35.9
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  3-苯丙醇 、 Bis[3-(dimethylamino)phenyl]-(4-methoxyphenyl)methanol 在 对甲苯磺酸 、 三氟乙酸 作用下， 以 甲苯 为溶剂， 以48%的产率得到3,3'-((4-methoxyphenyl)(3-phenylpropoxy)methylene)bis(N,N-dimethylaniline)
  参考文献：
  名称：

  Development of Trityl-Based Photolabile Hydroxyl Protecting Groups

  摘要：

  A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.

  DOI：

  10.1021/jo200692c
• 作为产物：
  描述：

  4-甲氧基苯甲酸甲酯 、 magnesium,N,N-dimethylaniline,bromide 生成 Bis[3-(dimethylamino)phenyl]-(4-methoxyphenyl)methanol
  参考文献：
  名称：

  Development of Trityl-Based Photolabile Hydroxyl Protecting Groups

  摘要：

  A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.

  DOI：

  10.1021/jo200692c

文献信息

• Development of Trityl-Based Photolabile Hydroxyl Protecting Groups
  作者：Lei Zhou、Haishen Yang、Pengfei Wang

  DOI：10.1021/jo200692c

  日期：2011.8.5

  A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.