2,2',2'',2'''-tetramethyl-4,4',4'',4'''-ethanediylidene-tetra-phenol | 108261-54-7

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: 2,2',2'',2'''-tetramethyl-4,4',4'',4'''-ethanediylidene-tetra-phenol
• 英文别名: 2,2',2'',2'''-Tetramethyl-4,4',4'',4'''-aethandiyliden-tetra-phenol；1,1,2,2-tetrakis(4-hydroxy-3-methyl-phenyl)-ethane；1,1,2,2-tetrakis(3-methyl-4-hydroxyphenyl)ethane；2-Methyl-4-[1,2,2-tris(4-hydroxy-3-methylphenyl)ethyl]phenol
• CAS: 108261-54-7
• 化学式: C₃₀H₃₀O₄
• 分子量: 454.566
• InChiKey: SOEZXSYRGLWFQV-UHFFFAOYSA-N

物化性质

• 熔点：
  263-267 °C
• 沸点：
  591.0±45.0 °C(Predicted)
• 密度：
  1.230±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  7.1
• 重原子数：
  34
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  80.9
• 氢给体数：
  4
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2,2',2'',2'''-tetramethyl-4,4',4'',4'''-ethanediylidene-tetra-phenol 在 chromium(VI) oxide 、 sodium hydroxide 、 溶剂黄146 作用下， 生成 4,4'-dimethoxy-3,3'-dimethylbenzophenone
  参考文献：
  名称：

  Eine einfache Synthese mehrfach substituierter Äthane

  摘要：

  DOI：

  10.1007/bf00899471
• 作为产物：
  描述：

  sodium o-cresolate 在 三氯化铝 作用下， 生成 2,2',2'',2'''-tetramethyl-4,4',4'',4'''-ethanediylidene-tetra-phenol
  参考文献：
  名称：

  Eine einfache Synthese mehrfach substituierter Äthane

  摘要：

  DOI：

  10.1007/bf00899471

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• Clathrate compounds comprising tetrakisphenols as host
  申请人：Nippon Soda Co., Ltd.

  公开号：US05364977A1

  公开（公告）日：1994-11-15

  The present invention provides novel clathrate compounds using tetrakisphenols as host. The clathrate compounds are obtained easily and efficiently by reacting tetrakisphenols represented by the general formula [I] as host and various organic compounds such as alcohol, ether, ester, ketone, heterocyclic compounds containing nitrogen, essential oil, perfume and the like as guest under the condition of solvent-free or diluted with solvent if required. ##STR1## wherein X represents (CH.sub.2)n, n represents 0-3, and R.sup.1 and R.sup.2 represents each independently hydrogen atom, a lower alkyl group, a pheny group optionally having substituents, a halogen atom or a lower alcoxy group. The clathrate compounds specified in the present invention are useful in the technological field of selective separation, chemical stabilization, conversion to non-volatility, powder processing and the like.

  本发明提供了以四酚为宿主的新型蛛网蛛酯化合物。这些蛛网蛛酯化合物通过在无溶剂条件下或者必要时稀释溶剂的情况下，通过将以通用式[I]表示的四酚作为宿主，与各种有机化合物如醇、醚、酯、酮、含氮的杂环化合物、精油、香水等作为客体反应而轻松高效地获得。其中X代表(CH2)n，n代表0-3，R^1和R^2分别独立表示氢原子、较低的烷基基团、可能具有取代基团的苯基、卤原子或较低的烷氧基团。本发明中指定的蛛网蛛酯化合物在选择性分离、化学稳定化、转化为非挥发性、粉末加工等技术领域中具有用途。
• Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10197914B2

  公开（公告）日：2019-02-05

  The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.

  本发明提供了一种含有（A）含有硅氧烷链的聚合物化合物的阳性感光树脂组合物，该聚合物化合物具有由通式（1）所示的重复单元和重量平均分子量为3,000至500,000，（B）能够通过光生成酸并增加在水性碱性溶液中的溶解速率的感光材料，（C）交联剂和（D）溶剂。可以提供一种阳性感光树脂组合物，可以解决在金属线路（如Cu和Al）、电极和基板上引起的剥离问题，特别是在SiN等基板上，可以在使用广泛的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上形成具有前向锥形形状的细微图案，而不会产生污点和底部轮廓。
• METHOD OF PRODUCING POLY(ORTHO-METHYLPHENOL)
  申请人：AZUMA Rie

  公开号：US20070197832A1

  公开（公告）日：2007-08-23

  Poly(ortho-methylphenol) is obtainable at high purities and yields using industrial processes by causing a secondary amine and formaldehyde to react with a polyphenol (first step), and then breaking down the aminomethyl group of the obtained poly(ortho-aminomethyl)phenol by means of hydrogenolysis in the presence of a hydrogenation catalyst (second step).

  聚(正甲基苯酚)可通过工业过程获得高纯度和高收率，方法是首先使二级胺和甲醛与多酚反应（第一步），然后在氢化催化剂的存在下通过氢解分解所得的聚(正甲基氨甲基苯酚)的氨甲基基团（第二步）。