Use of dithiophosphinic acids of the general formula HS2P(R1)(R2) and/or salts thereof for producing chrome-free, polymer-containing corrosion control layers on metallic surfaces, R1 and R2 independently of one another each being organic radicals having 1 to 30 C atoms.
使用通式 HS2P(R1)(R2)的二
硫代
膦酸和/或其盐在
金属表面生成无
铬、含聚合物的腐蚀控制层,其中 R1 和 R2 各自独立地为具有 1 至 30 个 C 原子的有机基。