1,8-bis(phenylthiomethyl)-naphthalene | 97840-91-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1,8-bis(phenylthiomethyl)-naphthalene
• 英文别名: 1,8-bis(phenylthiomethyl)naphthalene；1,8-bis(phenythiomethyl)naphthalene；1,8-Bis((phenylthio)methyl)naphthalene；1,8-bis(phenylsulfanylmethyl)naphthalene
• CAS: 97840-91-0
• 化学式: C₂₄H₂₀S₂
• 分子量: 372.555
• InChiKey: GLEBWHLBCAWSAW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.2
• 重原子数：
  26
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  50.6
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1,8-bis(phenylthiomethyl)-naphthalene 在 二苯甲酮 作用下， 以 乙腈 为溶剂， 以5.5%的产率得到苊
  参考文献：
  名称：

  Laser-jet photolysis of 1,8-bis(substituted-methyl)naphthalenes; the effect of heteroatom leaving groups on the two-photon C–C bond formation

  摘要：

  通过激光喷射光解 1,8-双（苯氧甲基）-(1a)、1,8-双（苯硫甲基）-(1b) 和 1,8-双（苯硒甲基）-萘 (1c)，苊 4 的生成与离去基团的喉原子有很大关系；萘消耗量的递增顺序为 1câ1b > 1a，而 4 的生成顺序为 1c > 1a > 1b。

  DOI：

  10.1039/c39930000628
• 作为产物：
  描述：

  1,8-萘二甲酸酐 在 lithium aluminium tetrahydride 、 氢溴酸 、 sodium 作用下， 以 乙醇 为溶剂， 生成 1,8-bis(phenylthiomethyl)-naphthalene
  参考文献：
  名称：

  Ouchi, Akihiko; Koga, Yoshinori; Alam, Maksudul M., Journal of the Chemical Society. Perkin transactions II, 1996, # 8, p. 1705 - 1710

  摘要：

  DOI：

文献信息

• Laser-jet photolysis of 1,8-bis(substituted-methyl)naphthalenes; the effect of heteroatom leaving groups on the two-photon C–C bond formation
  作者：Akihiko Ouchi、Waldemar Adam

  DOI：10.1039/c39930000628

  日期：——

  The formation of acenaphthene 4 by laser-jet photolysis of 1,8-bis(phenoxyrmethyl)-(1a), 1,8-bis(phenylthiomethyl)-(1b) and 1,8-bis(phenylselenomethyl)-naphthalene (1c) strongly depends on the hetroatom of the leaving group; the increasing order of naphthalene consumption was 1c≈1b > 1a, whereas that for the formation of 4 was 1c > 1a > 1b.

  通过激光喷射光解 1,8-双（苯氧甲基）-(1a)、1,8-双（苯硫甲基）-(1b) 和 1,8-双（苯硒甲基）-萘 (1c)，苊 4 的生成与离去基团的喉原子有很大关系；萘消耗量的递增顺序为 1câ1b > 1a，而 4 的生成顺序为 1c > 1a > 1b。
• Mass spectral rearrangements ofN-(4′-arylthio-2′-butynyl)N-(2″-arylthio-2″-propenyl)-p-toluidines,N,N-bis(2′-arylthio-2′-propenyl)-p-toluidines and 1,2-bis(arylthio)acenaphthenes
  作者：P. E. Glaspy、R. A. Hancock、B. S. Thyagarajan

  DOI：10.1002/oms.1210200312

  日期：1985.3

  AbstractUnder electron impact the title compounds display, in addition to the sequential loss of the arylthio groups, the elimination of a bisaryl disulphide moiety, but they do not eliminate sulphur. The behaviour of the p‐toluidine derivatives supports the rearrangement pathway proposed earlier for N,N‐bis(4′‐arylthio‐2′‐butynyl)anilines.
• Highly efficient CC bond formation in the two-photon chemistry of 1,8-bis(substituted-methyl)naphthalenes by direct excitation of photoactive leaving groups
  作者：Akihiko Ouchi、Akira Yabe、Waldemar Adam

  DOI：10.1016/s0040-4039(00)73419-8

  日期：1994.8

  High efficiency in the two-photon intramolecular C-C bond formation to the two-photon product acenaphthene (4), obtained in a maximum yield of 72%, was achieved by direct activation of two separate leaving groups of 1,8-bis(phenoxymethyl)-(1a), 1,8-bis(phenylthiomethyl)-(1b), and 1,8-bis(phenylselenomethyl)-naphthalenes (1c) during KrF excimer laser (248 nm) and of 1,8-bis(4-benzoylphenoxymethyl)-(1d), 1,8-bis-(3-benzoylphenoxymethyl)-(1e), and 1,8-bis(2-naphthoxymethyl)naphthalenes (1f) during XeF excimer laser (351 nm) photolyses.
• Time-delayed, two-color excimer laser photolysis of 1,8-bis(substituted-methyl)naphthalenes with group 16 atom leaving groups
  作者：Akihiko Ouchi、Yoshinori Koga

  DOI：10.1016/0040-4039(95)01970-s

  日期：1995.12

  Time-delayed, two-color photolysis of 1,8-bis(phenoxymethyl)-(1a), 1,8-bis(phenylthiomethyl)-(1a), and 1,8-bis(phenylselenomethyl)-naphthalene (1c) was conducted by successive irradiation of XeCl (308 nm) and XeF (351 nm) excimer lasers. The yield of the two-photon product, acenaphthene 3, was strongly dependent on the delay time and showed two maxima at different delay times.
• Ouchi, Akihiko; Koga, Yoshinori; Alam, Maksudul M., Journal of the Chemical Society. Perkin transactions II, 1996, # 8, p. 1705 - 1710
  作者：Ouchi, Akihiko、Koga, Yoshinori、Alam, Maksudul M.、Ito, Osamu

  DOI：——

  日期：——

表征谱图