N,N-bis-(2-octanoyloxy-ethyl)-aniline

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N,N-bis-(2-octanoyloxy-ethyl)-aniline
• 英文别名: N,N-Bis-(2-octanoyloxy-aethyl)-anilin；N,N-bis-(2-octanoyloxy-ethyl)-aniline；2-[N-(2-octanoyloxyethyl)anilino]ethyl octanoate
• 化学式: C₂₆H₄₃NO₄
• 分子量: 433.632
• InChiKey: IWXSNVXYPIBDKS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.8
• 重原子数：
  31
• 可旋转键数：
  21
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.69
• 拓扑面积：
  55.8
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  辛酸 、 N,N-二羟乙基苯胺 生成 N,N-bis-(2-octanoyloxy-ethyl)-aniline
  参考文献：
  名称：

  Arai; Oda, Kogyo Kagaku zasshi / Journal of the Society of Chemical Industry, 1954, vol. 57, p. 402,404

  摘要：

  DOI：

文献信息

• ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210149301A1

  公开（公告）日：2021-05-20

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

  提供具有公式（1）的醇铵盐，作为酸扩散抑制剂和化学增强型抗蚀剂组合物。当通过光刻加工时，该抗蚀剂组合物表现出溶解对比度，抑制酸扩散效果以及出色的光刻性能因素，例如CDU，LWR和灵敏度。
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200249571A1

  公开（公告）日：2020-08-06

  A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.

  一种抗蚀组合物，包括具有公式（1）作为PAG的磺酸盐、基础聚合物和有机溶剂。在光刻工艺中加工时，该组合物具有光透过率、抑制酸扩散效果和优异的光刻性能因素，例如DOF、LWR和MEF。还提供了一种从该组合物形成抗蚀图案的光刻工艺。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20220127225A1

  公开（公告）日：2022-04-28

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

  提供一种化学式为(1)的盐类，作为酸扩散抑制剂，并提供一种化学增强型光刻胶组合物，其中包括该酸扩散抑制剂。当通过光刻技术进行加工时，该光刻胶组合物形成的图案具有最小的缺陷和出色的光刻性能因子，如CDU、LWR和DOF。
• Arai; Oda, Kogyo Kagaku zasshi / Journal of the Society of Chemical Industry, 1954, vol. 57, p. 402,404
  作者：Arai、Oda

  DOI：——

  日期：——