Photomask material and process of producing photomask from the photomask material
申请人:FUJI PHOTO FILM CO., LTD.
公开号:US20030091908A1
公开(公告)日:2003-05-15
A photomask material comprising a transmissive substrate and a photosensitive layer formed on a temporary substrate laminated on the transmissive substrate with the photosensitive layer faced to the transmissive substrate and a process of manufacturing a photomask from the photomask material is disclosed. The photosensitive layer is made of a composition comprising at least an alkali-soluble resin binder having a polymerizable unsaturated bond, a monomer having at least one polymerizable unsaturated bond, an photopolymerization initiator sensitive to light of a wavelength longer than 405 nm and a colorant surface-treated with a polymerizable dispersant.
本发明公开了一种光掩模材料,包括透射基板和形成在临时基板上的感光层,临时基板层压在透射基板上,感光层面向透射基板,还公开了用光掩模材料制造光掩模的工艺。光敏层是由一种组合物制成的,该组合物至少包括具有可聚合不饱和键的碱溶性树脂粘合剂、具有至少一个可聚合不饱和键的单体、对波长长于 405 纳米的光敏感的光聚合引发剂以及用可聚合分散剂进行表面处理的着色剂。