N,-N'-Dimethylpyromellitic acid diimide | 26011-79-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异吲哚及其衍生物
• 英文名称: N,-N'-Dimethylpyromellitic acid diimide
• 英文别名: N,N'-dimethylpyromellitimide；pyromellitic dimethyldiimide；pyromellitic dimethylimide；2,6-dimethyl-pyrrolo[3,4-f]isoindole-1,3,5,7-tetraone；2,6-Dimethyl-pyrrolo[3,4-f]isoindol-1,3,5,7-tetraon；1,4-Bis-methylamino-pyromellitsaeure-bis-methylimid；2,6-Dimethylpyrrolo[3,4-f]isoindole-1,3,5,7-tetrone
• CAS: 26011-79-0
• 化学式: C₁₂H₈N₂O₄
• 分子量: 244.207
• InChiKey: KFRQIZZPJFOLEH-UHFFFAOYSA-N

物化性质

• 熔点：
  370 °C (sublm)
• 沸点：
  438.5±28.0 °C(Predicted)
• 密度：
  1.568±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.1
• 重原子数：
  18
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  74.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  N,-N'-Dimethylpyromellitic acid diimide 在 盐酸 作用下， 反应 10.0h， 以78.5%的产率得到均苯四甲酸
  参考文献：
  名称：

  Preparation of benzenetetracarboxylic acids by the cobalt-catalyzed carbonylation of Schiff bases from benzenedicarbaldehydes and subsequent oxidation

  摘要：

  DOI：

  10.1021/jo00158a020
• 作为产物：
  描述：

  pyromellitic tetramethylamide 以100%的产率得到N,-N'-Dimethylpyromellitic acid diimide
  参考文献：
  名称：

  胺与羰基化合物和异硫氰酸酯的定量固相反应

  摘要：

  据报道，气态或固态胺与醛的一系列固相反应生成亚胺，固态酸酐生成二酰胺（由酰亚胺生成）或酰胺羧酸盐或酰亚胺，固态酰亚胺生成二酰胺，与固态内酯或碳酸盐生成固态反应。得到官能化的氨基甲酸酯，与聚碳酸酯得到降解的氨解，和与固体异硫氰酸酯得到硫脲。二酰胺通过固态热解或酸催化作用生成酰亚胺。据报道，各种双反应，两步反应，3级反应和顺序反应均处于固态而不熔化。在53个已报告的反应实例中，产率是定量的，并且在100％产率的反应中无需进行后处理（除了四次洗涤）。最初的三个固态反应但与液态产物的反应不是定量的。升至公斤级显示了该技术在大规模应用中的前景。原子力显微镜的超显微分析通过三步法中影响深远的各向异性分子运动阐明了固态机制。还使用AFM研究了聚碳酸酯的气固氨基分解酶。讨论了对可持续化学的影响。

  DOI：

  10.1016/s0040-4020(00)00511-1

文献信息

• Diethyl N , N′ -dimethylpyrrol[3,4- f ]isoindole-1,7-dicarboxylate as a 14π-electronic aromatic compound with two azomethine-ylide moieties
  作者：Shogo Hiraoka、Hiroyuki Tahara、Shigeki Mori、Tetsuo Okujima、Masayoshi Takase、Takahiro Nakae、Hidemitsu Uno

  DOI：10.1016/j.tet.2017.01.015

  日期：2017.2

  8-dihydro-4,8-methanopyrrol[3,4-f]isoindole-1,7-dicarboxylate produced diethyl 9-oxo-2,6-dimethyl-4,8-dihydro-4,8-methanopyrrol[3,4-f]isoindole-1,7-dicarboxylate. This carbonyl derivative spontaneously underwent cheletropic extrusion of carbon monoxide, producing diethyl 2,6-dimethylpyrrol[3,4-f]isoindole-1,7-dicarboxylate, which showed 14π-electronic aromaticity on the whole five-six-five ring system.

  9-羟基-2,6-二甲基-4,8-​​二氢-4,8-​​甲基吡咯[3,4- f ]异吲哚-1,7-二羧酸二乙酯的Parikh-Doering氧化生成二乙基9-oxo-2,6 -二甲基-4,8-​​二氢-4,8-​​甲基吡咯[3,4- f ]异吲哚-1,7-二羧酸酯。该羰基衍生物自发地经历一氧化碳的偏压挤出，生成2,6-二甲基吡咯[3,4- f ]异吲哚-1,7-二羧酸二乙酯，在整个五六十五环体系上显示14π电子芳香性。
• RESIN COMPOSITION
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20190241716A1

  公开（公告）日：2019-08-08

  The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO) n —; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO) n —; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.

  本发明提供了一种树脂组合物，具有高灵敏度，并用于生产具有低吸水率的固化膜。该树脂组合物包括：(a)可溶于碱的树脂和(b1)含有酚羟基的酰胺酚化合物，其中酚羟基化合物中的单价基在邻位上，和/或(b2)含有羧基的芳香酰胺酸化合物，其中羧基化合物中的单价基在邻位上，其通式如下所示：在通式(1)中，X是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(1)中的羰基碳，或具有—(YO)n—的单价有机基；在通式(2)中，U是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(2)中的酰胺氮，或具有—(YO)n—的单价有机基；其中Y是含有1到10个碳原子的烷基，n是1到20的整数。
• METHOD FOR PRODUCING AROMATIC COMPOUND
  申请人：Sumitomo Chemical Company, Limited

  公开号：US20150322101A1

  公开（公告）日：2015-11-12

  A method is provided for producing an aromatic compound, including a step of mixing a compound represented by formula (A) and a compound represented by formula (B): in the presence of at least one phosphine compound selected from the group consisting of a phosphine represented by formula (C) and a phosphonium salt represented by formula (F): a base, a palladium compound, and an aprotic organic solvent.

  提供一种生产芳香化合物的方法，包括以下步骤：在至少一种磷化物化合物的存在下，将由化学式(A)表示的化合物与由化学式(B)表示的化合物混合；所述磷化物化合物选择自由化学式(C)表示的磷化物和由化学式(F)表示的磷酸盐；还包括碱、钯化合物和无水有机溶剂。
• Polymer compound and polymer light emitting device
  申请人：Yamamoto Takakazu

  公开号：US20120200808A1

  公开（公告）日：2012-08-09

  To provide a polymer compound which is useful as a light emitting material or charge transport material having a boron atom. A polymer compound comprising a structure represented by a formula (1) as described below: wherein R 1 , R 2 , and R 3 each independently represents a hydrogen atom or a substituent.

  提供一种聚合物化合物，可用作具有硼原子的发光材料或电荷传输材料。包括以下公式（1）所表示的结构的聚合物化合物：其中R1、R2和R3分别独立表示氢原子或取代基。
• RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210397092A1

  公开（公告）日：2021-12-23

  A resist underlayer film material used in multilayer resist method contains (A) compound shown by following general formula (1), and (B) organic solvent, where X independently represents monovalent organic group shown by following general formula (2); W contains an “m” number of partial structures each independently shown by following formula (3); “m” and “n” each represent an integer of 1 to 10; broken lines represent bonding arms; Z represents aromatic group; A represents single bond or —O—(CH 2 ) p —; “k” represents integer of 1 to 5; “p” represents integer of 1 to 10; R 01 represents hydrogen atom or monovalent organic group having 1 to 10 carbon atoms. Material is capable of forming resist underlayer film excellent in planarizing property in fine patterning process by multilayer resist method in semiconductor-device manufacturing process; and patterning processes and methods for forming resist underlayer film use material.

  多层光刻法中使用的抗蚀底层膜材料包含以下通式（1）所示的化合物（A）和有机溶剂（B），其中X独立地表示由以下通式（2）所示的一价有机基团；W包含“m”个部分结构，每个部分结构都独立地由以下式（3）所示；“m”和“n”分别表示1到10的整数；断裂的线表示连接臂；Z表示芳香基团；A表示单键或—O—（CH2）p—；“k”表示1到5的整数；“p”表示1到10的整数；R01表示氢原子或具有1到10个碳原子的一价有机基团。该材料能够形成在半导体器件制造过程中通过多层光刻法具有平坦化性能的抗蚀底层膜，以及用于形成抗蚀底层膜的图案化过程和方法。