Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof
申请人:MALLINCKRODT BAKER, Inc.
公开号:EP1840659A2
公开(公告)日:2007-10-03
Microelectronic cleaning compositions for cleaning microelectronic substrates, and particularly cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by silicon dioxide, sensitive low-κ or high-κ dielectrics and copper, tungsten, tantalum, nickel, gold, cobalt, palladium, platinum, chromium, ruthenium, rhodium, iridium, hafnium, titanium, molybdenum, tin and other metallization, as well as substrates of Al or Al(Cu) metallizations and advanced interconnect technologies, are provided by microelectronic cleaning compositions comprising halogen acids, salts and derivatives thereof.
用于清洁微电子基底的微电子清洁组合物,特别是可与二氧化硅、敏感的低κ或高κ电介质以及铜、钨、钽、镍、金、钴、钯、铂、铬、钌、铑、铱、铪、钛、钼、锡和其他金属化的微电子基底一起使用并具有更好兼容性的清洁组合物、由卤酸、卤酸盐及其衍生物组成的微电子清洁组合物可为具有二氧化硅、敏感的低κ或高κ电介质和铜、钨、钽、镍、金、钴、钯、铂、铬、钌、铑、铱、铪、钛、钼、锡和其他金属化特征的有用基板以及铝或铝(铜)金属化基板和先进的互连技术提供清洁。