at ambient temperature by monitoring reactants and products with an electron impact mass spectrometer. At the low pressures used (0.7 and 1.0 mbar) the gas-phaseself-reaction is dominated by a ‘bimolecular’ H2-eliminating exit channel with a rate coefficient of k3b(300 K) = (1.3 ± 0.5) × 10−12 cm3 molecule−1 s−1 and leading to N2H2 + H2 or NNH2 + H2. Although the wall loss for NH2 radicals is relatively
NH 2分布图是在排气流反应器中于环境温度下通过用电子冲击质谱仪监测反应物和产物来测量的。在所用的低压(0.7和1.0 mbar)下,气相自反应主要由消除“双分子” H 2的出口通道控制,速率系数为k 3b(300 K)=(1.3±0.5)×10 -12 cm 3分子-1 s -1并产生N 2 H 2 + H 2或NNH 2 + H 2。尽管NH 2自由基的壁损耗相对较小(k瓦特≈6-14小号-1),对整体NH贡献2衰变是相对缓慢的气相反应,由于重要。异质反应产生N 2 H 4分子。
Khusidman, M. B.; Vyatkin, V. P.; Grigor'eva, N. V., Journal of applied chemistry of the USSR, 1982, vol. 55, p. 1345 - 1349
作者:Khusidman, M. B.、Vyatkin, V. P.、Grigor'eva, N. V.、Posadov, I. A.