5-nitro-naphthalene-2-sulfonic acid amide

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 5-nitro-naphthalene-2-sulfonic acid amide
• 英文别名: 5-Nitro-naphthalin-2-sulfonsaeure-amid；5-nitronaphthalene-2-sulfonamide；5-Nitronaphthalene-2-sulfonamide
• 化学式: C₁₀H₈N₂O₄S
• 分子量: 252.251
• InChiKey: GLYSVZPNDUMBPN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  114
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 氨 、 苯 作用下， 生成 5-nitro-naphthalene-2-sulfonic acid amide
  参考文献：
  名称：

  Woroshzow; Gribow, Zhurnal Obshchei Khimii, 1932, vol. 2, p. 929,936

  摘要：

  DOI：

文献信息

• [EN] SUBSTITUTED SULFONAMIDES USEFUL AS ANTIAPOPTOTIC BCL INHIBITORS<br/>[FR] SULFONAMIDES SUBSTITUÉS UTILES COMME INHIBITEURS DE BCL ANTI-APOPTOTIQUES
  申请人：BRISTOL MYERS SQUIBB CO

  公开号：WO2012162365A1

  公开（公告）日：2012-11-29

  Disclosed are compounds of Formula (I), or a pharmaceutically acceptable salt thereof, wherein: W and Q and G are defined herein. Also disclosed are methods of using such compounds as inhibitors of Bcl-2 family antiapoptotic proteins for the treatment of cancer; and pharmaceutical compositions comprising such compounds.

  揭示了式（I）的化合物或其药学上可接受的盐，其中：W、Q和G在此处被定义。还揭示了将这些化合物用作Bcl-2家族抗凋亡蛋白的抑制剂以治疗癌症的方法；以及包含这些化合物的药物组合物。
• SUBSTITUTED SULFONAMIDES USEFUL AS ANTIAPOPTOTIC BCL INHIBITORS
  申请人：Borzilleri Robert M.

  公开号：US20140135318A1

  公开（公告）日：2014-05-15

  Disclosed are compounds of Formula (I), or a pharmaceutically acceptable salt thereof, wherein: W and Q and G are defined herein. Also disclosed are methods of using such compounds as inhibitors of Bcl-2 family antiapoptotic proteins for the treatment of cancer; and pharmaceutical compositions comprising such compounds.

  本发明涉及式（I）的化合物或其药学上可接受的盐，其中：W、Q和G的定义如下。还公开了使用这些化合物作为Bcl-2家族抗凋亡蛋白的抑制剂用于治疗癌症的方法；以及包含这些化合物的药物组合物。
• POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3896521A1

  公开（公告）日：2021-10-20

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of -CO- and -SO2-; X1 is a tetravalent organic group; and 1 is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任何一种；X1 是四价有机基团；1 是 0 或 1；X2 是二价有机基团。
• Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component
  申请人：International Business Machines Corporation

  公开号：US11333975B2

  公开（公告）日：2022-05-17

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of —CO— and —SO2—; X1 is a tetravalent organic group; and l is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任意一种；X1 是四价有机基团；l 是 0 或 1；X2 是二价有机基团。
• Cleve, 1876, # 7, p. 53
  作者：Cleve

  DOI：——

  日期：——