5-chloroacenaphthylene | 13846-77-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 吖萘类
• 英文名称: 5-chloroacenaphthylene
• 英文别名: 4-Chlor-acenaphthylen；5-Chloracenaphthylen；Acenaphthylene, 5-chloro-
• CAS: 13846-77-0
• 化学式: C₁₂H₇Cl
• 分子量: 186.641
• InChiKey: VTEHXZOGYXPKKC-UHFFFAOYSA-N

物化性质

• 熔点：
  67.5-68 °C
• 沸点：
  325.9±21.0 °C(Predicted)
• 密度：
  1.331±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  5-chloroacenaphthylene 在 chromium(VI) oxide 、 氯 、 溶剂黄146 作用下， 以 溶剂黄146 为溶剂， 生成 5-chloro-acenaphthene-1,2-dione
  参考文献：
  名称：

  Petrenko,G.P.; Anikin,V.F., Journal of Organic Chemistry USSR (English Translation), 1973, vol. 9, p. 810 - 814

  摘要：

  DOI：
• 作为产物：
  描述：

  5-氯苊 在 盐酸 、 氢氧化钾 、 sodium hydroxide 、 lead(II,IV) oxide 作用下， 以 甲醇 、 乙醚 、 乙醇 、 苯 为溶剂， 生成 5-chloroacenaphthylene
  参考文献：
  名称：

  Usachenko,V.G.; Petrenko,G.P., Soviet progress in chemistry, 1970, vol. 36, # 11, p. 90 - 91

  摘要：

  DOI：

文献信息

• Nucleophilic displacement of chlorine from 5-chloroacenaphthylene
  作者：M. J. Perkins

  DOI：10.1039/c2971000231a

  日期：——

  5-Chloroacenaphthylene is converted into 5-ethoxyacenaphthylene by reaction with sodium ethoxide.

  通过与乙醇钠反应，将5-氯ac乙烯转化为5-乙氧基ac乙烯。
• Negative resist composition and patterning process using the same
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2256552A1

  公开（公告）日：2010-12-01

  There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2); or a polymer obtained by subjecting the functional groups of the polymerizedly obtained polymer to a further chemical conversion; and wherein the repeating units derived from the monomers represented by the general formula (1) are included in the obtained polymer at a sum ratio of 50 mole% or more relative to a total amount of all repeating units constituting the obtained polymer. There can be provided a negative resist composition having an excellent resolution and an enhanced etching resistance in photolithography for fine processing, and particularly in lithography adopting, as an exposure source, KrF laser, extreme ultraviolet rays, electron beam, X-rays, or the like; and a patterning process using the same.

  本发明公开了一种抗蚀剂组合物，该组合物包括(A)可溶于碱且在酸的作用下在碱中不溶解的碱基聚合物；和/或交联剂与可溶于碱且在酸的作用下与交联剂反应从而在碱中不溶解的碱基聚合物的组合，(B)酸发生剂，和(C)作为碱性组分的含氮化合物；其中用作碱基聚合物的聚合物是：(A)可溶于碱且在酸的作用下在碱中不溶解的碱基聚合物，(B)酸发生剂，和(C)作为碱性组分的含氮化合物：通过聚合两种或两种以上由以下通式（1）表示的单体而得到的聚合物，或通过聚合含有一种或多种由以下通式（1）表示的单体和一种或多种由以下通式（2）表示的苯乙烯单体的单体混合物而得到的聚合物；或将聚合得到的聚合物的官能团进行进一步化学转化而得到的聚合物；以及 其中，由通式（1）代表的单体衍生的重复单元以相对于构成所得到的聚合物的所有重复单元总量 50 摩尔％或更高的总和比率包含在所得到的聚合物中。本发明可提供一种在用于精细加工的光刻技术中，特别是在采用 KrF 激光、极紫外线、电子束、X 射线或类似光源作为曝光源的光刻技术中，具有优异的分辨率和增强的抗蚀刻性的负型抗蚀剂组合物；以及使用该组合物的图案化工艺。
• Resin composition, prepreg, resin-added film, resin-added metal foil, metal-clad layered plate, and wiring plate
  申请人：PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

  公开号：US11242425B2

  公开（公告）日：2022-02-08

  A resin composition is provided and contains a compound (A) having at least one group represented by the following Formula (1) in a molecule, a crosslinking type curing agent (B), and an azo compound (C) that has an azo group in a molecule and has no heteroatom other than a nitrogen atom constituting the azo group. In Formula (1), n represents 0 to 10, Z represents an arylene group, and R1 to R3 each independently represent a hydrogen atom or an alkyl group.

  本发明提供了一种树脂组合物，其中包含分子中至少含有一个下式 (1) 所代表基团的化合物 (A)、交联型固化剂 (B) 以及分子中含有偶氮基团且除构成偶氮基团的氮原子外没有杂原子的偶氮化合物 (C)。 式（1）中，n 代表 0 至 10，Z 代表芳烯基，R1 至 R3 各自独立地代表氢原子或烷基。
• Anti-reflection coating forming composition
  申请人：——

  公开号：US20020086934A1

  公开（公告）日：2002-07-04

  An anti-reflection coating-forming composition is provided. This composition includes a polymer and a solvent. The polymer has a structural unit represented by the formula (1): 1 wherein R 1 is a monovalent atom other than a hydrogen atom or a monovalent group, and n is an integer of 0-4, provided that when n is an integer of 2-4, a plural number of R 1 's are the same or different; R 2 and R 3 are each a monovalent atom or group; and X is a bivalent group. The anti-reflection coating formed from this composition has a high antireflective effect, does not generate intermixing with a resist film, and enables a good resist pattern profile excellent in resolution and precision in cooperation with a positive or negative resist.

  提供了一种抗反射涂层形成组合物。这种组合物包括一种聚合物和一种溶剂。聚合物具有由式（1）表示的结构单元： 1 其中 R 1 是氢原子或一价基团以外的一价原子，n 是 0-4 的整数，但当 n 是 2-4 的整数时，R 1 的复数相同或不同；R 2 和 R 3 均为一价原子或基团；X 为二价基团。由这种组合物形成的抗反射涂层具有很高的抗反射效果，不会与抗蚀剂薄膜产生混杂，并且在与正极或负极抗蚀剂配合使用时，可以形成分辨率和精度极佳的抗蚀图案轮廓。
• Stereochemistry of the Addition of Bromine to Acenaphthylene Derivatives: Substituent and Solvent Effects
  作者：Valeriy F. Anikin、Vera V. Veduta、Andreas Merz

  DOI：10.1007/pl00010249

  日期：1999.5