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1-benzyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione | 23097-87-2

中文名称
——
中文别名
——
英文名称
1-benzyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione
英文别名
N-benzylisocyanuric acid;monobenzyl isocyanurate;benzyl isocyanurate;benzyl isocyanate;benzyl-[1,3,5]triazinetrione;Benzyl-[1,3,5]triazintrion;1-Benzyl-1,3,5-triazinane-2,4,6-trione
1-benzyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione化学式
CAS
23097-87-2
化学式
C10H9N3O3
mdl
——
分子量
219.2
InChiKey
RGWHWXCLWIRWMZ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    156-157 °C
  • 密度:
    1.392±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    0.5
  • 重原子数:
    16
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.1
  • 拓扑面积:
    78.5
  • 氢给体数:
    2
  • 氢受体数:
    3

SDS

SDS:5662a61b99eb939e5a98ae7983a62474
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反应信息

  • 作为反应物:
    参考文献:
    名称:
    摘要:
    Alkylation of disodium benzyl and disodium methyl isocyanurates with beta,beta'-dichlorodiethyl and beta,beta'-dibromodiethyl ethers was used to prepare 1-benzyl and 1-methyl 3,5-bis[2-(2-haloethoxy)ethyl] isocyanurates whose reaction with thiourea followed by hydrolysis gave the corresponding 1-alkyl 3,5-bis[2(2-mercaptoethoxy)ethyl] isocyanurates. 1-Benzyl and 1-methyl 3,5-bis[2-(2-chloroethyl)ethyl] isocyanurates were reacted with NaSCH2CH2OH to obtain the corresponding 1-alkyl 3,5-bis[2-(2-hydroxyethylthio)ethyl] isocyanurates. Treatment of the latter two esters with thionyl chloride gave 1-benzyl and 1-methyl 3,5-bis[2-(2-chloroethylthio)ethyl] isocyanurates, respectively.
    DOI:
    10.1023/a:1013281230316
  • 作为产物:
    参考文献:
    名称:
    トリアジンジオン化合物
    摘要:
    This invention provides a novel triazine dione compound useful as an alkylating agent for nucleophilic compounds. The invention relates to a compound represented by formula (I): [wherein each symbol is as defined in the present specification], an alkylating agent comprising the compound, and a method for alkylating nucleophilic compounds using the alkylating agent.
    公开号:
    JP2017081832A
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文献信息

  • <i>N</i>,<i>N′</i>-Dimethylated Benzyloxytriazinedione: A Stable Solid Reagent for Acid-Catalyzed<i>O</i>-Benzylation
    作者:Hikaru Fujita、Satoshi Kakuyama、Munetaka Kunishima
    DOI:10.1002/ejoc.201601387
    日期:2017.1.26
    DMBOT in the presence of an acid catalyst. In particular, 2,6-di-tert-butylpyridinium trifluoromethanesulfonate, which is a mild, stable, and non-hygroscopic acid catalyst, can be utilized for the reaction of DMBOT. Compared to other reported methods, DMBOT afforded better results in several challenging O-benzylation under non-basic conditions.
    N,N'-Dimethylated 6-(benzyloxy)-1,3,5-triazine-2,4(1H,3H)-dione (DMBOT) 已被开发为一种基于三嗪二酮的稳定固体试剂,用于酸催化 O -苄基化。在设计理念的基础上引入了N,N'-二甲基基团来固定核心的三嗪二酮骨架。DMBOT 的副产物可以通过简单的洗涤轻松去除。在酸催化剂存在下,使用 DMBOT 对各种酸和碱不稳定的醇进行 O-苄基化。特别是,2,6-二叔丁基吡啶鎓三氟甲磺酸盐是一种温和、稳定、不吸湿的酸催化剂,可用于DMBOT的反应。与其他报道的方法相比,DMBOT 在非碱性条件下的几个具有挑战性的 O-苄基化中提供了更好的结果。
  • <i>O</i>-Benzylation of Carboxylic Acids Using 2,4,6-Tris(benzyloxy)-1,3,5-triazine (TriBOT) under Acidic or Thermal Conditions
    作者:Kohei Yamada、Saki Yoshida、Hikaru Fujita、Masanori Kitamura、Munetaka Kunishima
    DOI:10.1002/ejoc.201501172
    日期:2015.12
    esters from carboxylic acids using the O-benzylating reagent 2,4,6-tris(benzyloxy)-1,3,5-triazine (TriBOT) have been developed. The reactions were conducted either in the presence of a catalytic amount of TfOH at room temperature (acidic conditions) or in the absence of TfOH at 180–230 °C (thermal conditions). Interestingly, the O-benzylation of hydroxy carboxylic acids under the two conditions afforded
    已经开发了两种使用 O-苄基化试剂 2,4,6-三(苄氧基)-1,3,5-三嗪 (TriBOT) 从羧酸合成苄酯的方法。反应是在催化量的 TfOH 存在下在室温(酸性条件)下进行的,或者在没有 TfOH 的情况下在 180-230 °C(热条件)下进行。有趣的是,羟基羧酸在两种条件下的 O-苄基化产生了不同的产物:酸性条件下的二苄基化产物和热条件下的羟基酯。除了这些结果,其他证据表明,前一个反应通过 SN1 型机制进行,而后者通过 SN2 型机制进行。
  • Study of the Reactivities of Acid-Catalyzed O-Benzylating Reagents Based on Structural Isomers of 1,3,5-Triazine
    作者:Hikaru Fujita、Naoko Hayakawa、Munetaka Kunishima
    DOI:10.1021/acs.joc.5b02059
    日期:2015.11.6
    5-triazine-2,4(1H,3H)-dione (MonoBOT), which have been previously suggested as reaction intermediates of the acid-catalyzed benzylation of 2,4,6-tris(benzyloxy)-1,3,5-triazine (TriBOT). We studied the effect on the reactivity of acid-catalyzed O-benzylation caused by the isomeric core triazine structures in these compounds by carrying out a kinetic study and estimating relative basicities using model compounds
    我们已经证明了4,6-双(苄氧基)-1,3,5-triazin-2(1 H)-one(DiBOT)和6-(苄氧基)-1,3,5-三嗪的O-苄基化能力-2,4(1 H,3 H)-二酮(MonoBOT),先前已被建议作为酸催化的2,4,6-三(苄氧基)-1,3,5-三嗪苄基反应的中间体(TriBOT)。我们通过进行动力学研究并使用模型化合物估算相对碱性,研究了这些化合物中异构体核心三嗪结构对酸催化的O-苄基化反应活性的影响。由于MonoBOT具有优异的反应活性,因此1,3,5-三嗪-2,4(1 H,3 H)-二酮是酸催化烷基化试剂的有前途的核心结构。
  • COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY
    申请人:Nissan Chemical Industries, Ltd.
    公开号:EP1560070A1
    公开(公告)日:2005-08-03
    There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
    本发明提供了一种用于形成防反射涂层的组合物,该组合物对用于制造半导体器件的波长的光具有良好的吸收性,对光的反射具有较高的保护效果,与光刻胶层相比具有较高的干蚀刻率。具体来说,用于形成抗反射涂层的组合物含有一种三嗪三酮化合物、低聚物化合物或聚合物化合物,其氮原子上的取代基为羟烷基结构。
  • ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER
    申请人:Nissan Chemical Industries, Ltd.
    公开号:EP1757986A1
    公开(公告)日:2007-02-28
    There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.
    本发明提供了一种抗反射涂层成型组合物,该组合物由具有嘧啶三酮结构、咪唑烷二酮结构、咪唑烷三酮结构或三嗪三酮结构的聚合物和溶剂组成。由该组合物制得的防反射涂层对反射光有很好的防止效果,不会与光刻胶混合,并可在光刻工艺中使用 ArF 准分子激光束(波长 193 nm)或 F2 准分子激光束(波长 157 nm)等短波长光。
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