在2-或3-位带有电子释放取代基的1-烷基-2-芳酰基-3-芳基氮丙啶与取代的对亚硝基苯酚反应,生成3,5-二氢-2 H-吡咯并[3,4- d ]恶唑。硝酮,芳基和芳酰基亚胺作为次要产物的分离支持以两个连续的1,3-偶极加成来解释反应,其中第二个区域特异性加成是自催化的,随后是Paal-Knorr缩合反应。
New nitrite ionic liquid (IL-ONO) and nanoparticles of organosilane-based nitrite ionic liquid immobilized on silica as nitrosonium sources for electrophilic aromatic nitrosation
作者:Hassan Valizadeh、Mohammad Amiri、Ashkan Shomali
DOI:10.1016/j.crci.2011.09.012
日期:2011.12
improved method for the synthesis of nitrosoarenes has been developed using a new nitriteionicliquid (IL-ONO) and immobilized nitriteionicliquid. These ionicliquids play as nitrosoniumsources for electrophilic aromatic nitrosation of active aromatics at 0–5 °C. Their action was accomplished in water and the satisfactory results were obtained under the mildconditions in short reaction time.
摘要 利用新型亚硝酸离子液体 (IL-ONO) 和固定化亚硝酸离子液体开发了一种合成亚硝基芳烃的改进方法。这些离子液体在 0–5 °C 下作为活性芳烃的亲电芳族亚硝化的亚硝基源。它们的作用是在水中完成的,在温和的条件下,在很短的反应时间内获得了令人满意的结果。
Compounds for the treatment of inflammatory disorders
申请人:Yu Wensheng
公开号:US20060276506A1
公开(公告)日:2006-12-07
This invention relates to compounds of the Formula (I):
or a pharmaceutically acceptable salt, solvate, ester or isomer thereof, which can be useful for the treatment of diseases or conditions mediated by MMPs, ADAMs, TACE, aggrecanase, TNF- or combinations thereof.
BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME
申请人:Katayama Mami
公开号:US20120070781A1
公开(公告)日:2012-03-22
An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
申请人:Katayama Mami
公开号:US08697332B2
公开(公告)日:2014-04-15
An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
COMPOUNDS FOR THE TREATMENT OF INFLAMMATORY DISORDERS
申请人:Yu Wensheng
公开号:US20090137586A1
公开(公告)日:2009-05-28
This invention relates to compounds of the Formula (I):
or a pharmaceutically acceptable salt, solvate, ester or isomer thereof, which can be useful for the treatment of diseases or conditions mediated by MMPs, ADAMs, TACE, aggrecanase, TNF- or combinations thereof.