4-Oxahomoadamantane | 21898-86-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧杂环己烷
• 英文名称: 4-Oxahomoadamantane
• 英文别名: 4-Oxa-homoadamantan；4-Oxatricyclo[4.3.1.1(3,8)]undecane；4-oxatricyclo[4.3.1.13,8]undecane
• CAS: 21898-86-2
• 化学式: C₁₀H₁₆O
• 分子量: 152.236
• InChiKey: YRGFTNYQBGNQCY-UHFFFAOYSA-N

物化性质

• 熔点：
  268-269 °C
• 沸点：
  215.7±8.0 °C(Predicted)
• 密度：
  1.026±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  金刚烷 在 过氧碳酸钠 、 三氟甲磺酸 作用下， 以 二氯甲烷 为溶剂， 反应 6.0h， 以84%的产率得到4-Oxahomoadamantane
  参考文献：
  名称：

  Olah, George A.; Wang, Qi; Krass, Norbert, Revue Roumaine de Chimie, 1991, vol. 36, # 4-7, p. 567 - 572

  摘要：

  DOI：

文献信息

• A Consecutive Double-Criegee Rearrangement Using TFPAA:  Stepwise Conversion of Homoadamantane to Oxahomoadamantanes
  作者：Pavel A. Krasutsky、Igor V. Kolomitsyn、Paul Kiprof、Robert M. Carlson、Nadiya A. Sydorenko、Andrey A. Fokin

  DOI：10.1021/jo001219z

  日期：2001.3.1

  Rearrangement of 4-methylhomoadamantan-4-ol (1) with trifluoroperacetic acid (TFPAA) in trifluoroacetic acid (TFAA) proceeds with the formation of 4-oxahomoadamantane 6 and its derivatives (4 and 5). 2-exo-Hydroxy-4-oxahomoadamantane (5) and 6 were identified as a result of consecutive O-insertion Criegee rearrangement processes. The absence of methyl trifluoroacetate and methyl trifluoroperacetate

  在三氟乙酸（TFAA）中将三氟过氧乙酸（TFPAA）与4-甲基高金刚烷-4-醇（1）进行重排，形成4-氧杂高锰金刚烷6及其衍生物（4和5）。由于连续的O-插入Criegee重排过程，确定了2-exo-Hydroxy-4-oxahomoadamantane（5）和6。反应产物中不存在三氟乙酸甲酯和三氟过乙酸甲酯，以及乙酰基三氟乙酰基过氧化物的存在，与在Criegee反应过程中两次而不是三次氧插入相一致。动力学考虑也排除了涉及最初的Criegee重排然后进行Baeyer-Villiger反应的机制。确定了4-乙基-3-氧杂高锰金刚烷-2-酮（4）的平行形成是4-甲基高锰金刚烷-4-醇（3）脱水的结果，随后是4-甲基高纯金刚烷-4-烯的环氧化（32） ）转化为4,5-环氧--4-甲基氨金刚烷（33），酸催化将33异构化为3-甲基高锰金刚烷-2-一（34），并将Baeyer-Villiger氧化为
• JP2002226436A
  申请人：——

  公开号：JP2002226436A

  公开（公告）日：2002-08-14
• JP2002284785A
  申请人：——

  公开号：JP2002284785A

  公开（公告）日：2002-10-03
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20190219921A1

  公开（公告）日：2019-07-18

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, R 11 and R 12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R 13 represents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.)
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20220206386A1

  公开（公告）日：2022-06-30

  An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General Formula (c1), in which a ratio of a content of the compound (C) to a content of the compound (B) is from 0.01% by mass to 10% by mass. In the formulae, L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxy group, or a carboxy group. It should be noted that at least one B represents the hydroxy group or the carboxy group. n represents an integer from 1 to 5. X represents an (n+1)-valent linking group. M + represents a sulfonium ion or an iodonium ion.