8-nitronaphthalene-1-sulfonyl chloride | 185908-35-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 8-nitronaphthalene-1-sulfonyl chloride
• 英文别名: 8-Nitro-1-naphthalinsulfonsaeurechlorid；8-Nitro-naphthalin-1-sulfonylchlorid；8-Nitro-naphthalin-sulfonylchlorid-(1)；8-Nitro-1-naphthalenesulfonyl chloride
• CAS: 185908-35-4
• 化学式: C₁₀H₆ClNO₄S
• 分子量: 271.681
• InChiKey: CCLNKZZQUZCGSD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  88.3
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  8-nitronaphthalene-1-sulfonyl chloride 在 磷化氢 、 碘 、 溶剂黄146 、 肼 作用下， 反应 2.0h， 生成 bis-(8-nitro-[1]naphthyl)-disulfide
  参考文献：
  名称：

  Kawahara, Yakugaku Zasshi/Journal of the Pharmaceutical Society of Japan, 1957, vol. 77, p. 963

  摘要：

  DOI：
• 作为产物：
  描述：

  1-萘磺酰氯 生成 8-nitronaphthalene-1-sulfonyl chloride
  参考文献：
  名称：

  Reissert, Chemische Berichte, 1922, vol. 55, p. 873

  摘要：

  DOI：

文献信息

• [EN] INHIBITORS OF CD40-CD154 BINDING<br/>[FR] INHIBITEURS DE LIAISON CD40-CD154
  申请人：TONIX PHARMACEUTICALS HOLDING CORP

  公开号：WO2020210831A1

  公开（公告）日：2020-10-15

  Disclosed herein are compounds including pharmaceutically acceptable salts, esters, prodrugs, hydrates and tautomers thereof which modulate the interactions of CD-40-CD40L. The compounds are useful for treating, ameliorating or preventing an autoimmune disease, inflammatory disease, or other immune-related disease in a patient in need of treatment.

  本文披露了包括药用可接受的盐、酯、前药、水合物和互变异构体在内的化合物，这些化合物调节CD-40-CD40L的相互作用。这些化合物可用于治疗、改善或预防患有自身免疫疾病、炎症性疾病或其他免疫相关疾病的患者。
• Light sensitive material for photomechanical reproduction
  申请人：AZOPLATE CORP

  公开号：US02773765A1

  公开（公告）日：1956-12-11

  The chlorides of nitronaphthalene sulphonic acids are reacted with amino or hydroxy or amino-acids are reacted with amino or hydroxy or amino-hydroxy compounds, especially of the aromatic or heterocyclic series to produce compounds as follows:- p : p1 - bis - (1 - Methyl - 5 - nitronaphthalene - 4 - sulphonic acid) - diphenyl ester, m.p. 224 DEG C. (example 2) made by stirring 1-methyl-5-nitronaphthalene - 4 - sulphochloride with p : p1 - dihydroxy-diphenyl and caustic soda in acetone, solvent removal and re-crystallization. 1 - Methyl - 5 : x - dinitronaphthalene - 4 - sulphonic acid - (11 - phenyl - 31 - methyl - 51 - pyrazole) - ester (decomposes at 100 DEG C.) made by heating the corresponding acid, which is itself made by nitrating 1-methylnaphthalene-4-sulphochloride, with the corresponding pyrazolone and caustic soda in acetone, solvent removal and washing after acidification. 1 - Methyl - 5 - x - dinitronaphthalene - 4 - sulphonic acid - [61 - hydroxy - pyridino - (111 : 211 : 11 : 21) - benzimidazole] ester (decomposes at 190 DEG C.) is made similarly using the corresponding benzimidazole. p : p1 - bis - (1 - Methyl - 5 - x - dinitronaphthalene - 4 - sulphonamido - diphenylamine (decomposes at 145 DEG C.) (example 3) is made similarly using diamino-diphenylamine. p : p1 - bis - (1 - Methyl - 5 : x - dinitronaphthalene - 4 - sulphonamido) - 2 : 21 - dimethoxy - diphenylsulphide (decomposes at 165 DEG C.) i made similarly using 4 : 41-diamino-2 : 21-dimethoxy-diphenylsulphide. The corresponding sulphone is made analogously. p : p1 - bis - (1 - Methyl - 8 - nitronaphthalene - 4 - sulphonamido) - diphenylmethane (decomposes at 160 DEG C.) is made similarly from the corresponding sulphochloride and diaminodiphenylmethane. N : N1 - bis - (1 - methyl - 5 : x - dinitronaphthalene - 4 - sulphonyl) - 4 (or else 7) - aminobenzimidazole (decomposes at 250 DEG C.) (example 4) is made similarly from the corresponding sulphochloride and 7-amino-benzimidazole. p : p1 - bis - (1 : 8 - Nitronaphthalene - sulphonamido)-diphenylmethane (m.p. 170 DEG C.) (example 5) is made similarly from the corresponding sulphochloride and diaminodiphenylmethane. The bis - [naphthyoquinone - (1 : 2) - diazide - (2) - 5 - sulphonic acid] ester of bis - (2 - hydroxynaphthyl 1) methane (example 6) is made by condensation thereof using sodium carbonate in acetone. O - N - bis - (1 : 8 - nitronaphthalene - sulphonyl) - p - N - methylaminophenol (m.p. 250 DEG C.) (example 7) is made by condensing the corresponding sulphochloride with metol. p - [Naphthoquinone - (11 : 21) - diazide - (21) - 51 - sulphonamido] - phenol - 1 - nitronaphthalene-8-sulphonic acid ester (m.p. 220 DEG C.) (example 9) is made by condensing the condensation product of metol and 2-diazo-1-naphthol - 5 - sulphonic acid with 1 : 8 - nitronaphthalene-sulphonic acid chloride in alkaline dioxane.

  硝基萘磺酸氯化物与氨基、羟基或氨基酸反应，或者氨基、羟基或氨基羟基化合物与芳香族或杂环系列反应，以产生以下化合物：p：p1-双（1-甲基-5-硝基萘磺酸）-二苯酯，熔点224℃（例2），通过在丙酮中搅拌1-甲基-5-硝基萘磺酰氯与p：p1-二羟基二苯并苏打和氢氧化钠反应，去除溶剂并重结晶得到。1-甲基-5：x-二硝基萘磺酸-(11-苯基-31-甲基-51-吡唑啉)-酯（分解温度100℃），通过将相应的酸加热制得，该酸本身是通过硝化1-甲基萘磺酰氯制得，与相应的吡唑酮和氢氧化钠在丙酮中反应，去除溶剂并在酸化后洗涤得到。1-甲基-5-x-二硝基萘磺酸-[61-羟基-吡啶-（111：211：11：21）-苯并咪唑]酯（分解温度190℃）也是类似地使用相应的苯并咪唑制备的。p：p1-双（1-甲基-5-x-二硝基萘磺酰胺-二苯胺（分解温度145℃）（例3）也是类似地使用二氨基二苯胺制备的。p：p1-双（1-甲基-5：x-二硝基萘磺酰胺）-2：21-二甲氧基-二苯基硫醚（分解温度165℃）也是类似地使用4：41-二氨基-2：21-二甲氧基-二苯基硫醚制备的。相应的砜类似地制备。p：p1-双（1-甲基-8-硝基萘磺酰胺）-二苯甲烷（分解温度160℃）也是类似地使用相应的萘磺酰氯和二氨基二苯甲烷制备的。N：N1-双（1-甲基-5：x-二硝基萘磺酰基）-4（或7）-氨基苯并咪唑（分解温度250℃）（例4）也是类似地使用相应的萘磺酰氯和7-氨基苯并咪唑制备的。p：p1-双（1：8-硝基萘磺酰胺）-二苯甲烷（熔点170℃）（例5）也是类似地使用相应的萘磺酰氯和二氨基二苯甲烷制备的。双[萘醌-(1：2)-重氮-(2)-5-磺酸基]-双(2-羟基萘基1)甲烷（例6）是通过在丙酮中使用碳酸钠对其进行缩合制备的。O-N-双（1：8-硝基萘磺酰基）-p-N-甲基氨基酚（熔点250℃）（例7）是通过将相应的萘磺酰氯与甲酚缩合制得的。p-[萘醌-(11：21)-重氮-(21)-51-磺酰胺基]-酚-1-硝基萘磺酸酯（熔点220℃）（例9）是通过将甲酚和2-重氮-1-萘酚-5-磺酸的缩合产物与1：8-萘磺酰氯在碱性二噁烷中缩合制备的。
• POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3896521A1

  公开（公告）日：2021-10-20

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of -CO- and -SO2-; X1 is a tetravalent organic group; and 1 is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任何一种；X1 是四价有机基团；1 是 0 或 1；X2 是二价有机基团。
• Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component
  申请人：International Business Machines Corporation

  公开号：US11333975B2

  公开（公告）日：2022-05-17

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of —CO— and —SO2—; X1 is a tetravalent organic group; and l is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任意一种；X1 是四价有机基团；l 是 0 或 1；X2 是二价有机基团。
• Erdmann; Suevern, Justus Liebigs Annalen der Chemie, 1893, vol. 275, p. 252
  作者：Erdmann、Suevern

  DOI：——

  日期：——