[2-(1-甲乙氧基)乙基]苯 | 68039-47-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: [2-(1-甲乙氧基)乙基]苯
• 中文别名: 风信子醚
• 英文名称: (2-isopropoxyethyl)benzene
• 英文别名: 2-propan-2-yloxyethylbenzene
• CAS: 68039-47-4
• 化学式: C₁₁H₁₆O
• mdl: MFCD00169847
• 分子量: 164.247
• InChiKey: FMPXLXBVYDFXIC-UHFFFAOYSA-N

物化性质

• 沸点：
  82-88 °C(Press: 8 Torr)
• 密度：
  0.920±0.06 g/cm3(Predicted)
• LogP：
  2.990 (est)

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  12
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.454
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  2-碘代乙基苯 在 锌 作用下， 以 异丙醇 为溶剂， 反应 20.0h， 以55%的产率得到[2-(1-甲乙氧基)乙基]苯
  参考文献：
  名称：

  Photolysis of 2-phenylethyl and 4-phenyl-1-butyl halides in alcoholic solvents

  摘要：

  DOI：

  10.1016/s0040-4020(01)87368-3

文献信息

• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• USE OF SUBSTITUTED ISOQUINOLINONES, ISOQUINOLINDIONES, ISOQUINOLINTRIONES AND DIHYDROISOQUINOLINONES OR IN EACH CASE SALTS THEREOF AS ACTIVE AGENTS AGAINST ABIOTIC STRESS IN PLANTS
  申请人：Frackenpohl Jens

  公开号：US20140302987A1

  公开（公告）日：2014-10-09

  Use of substituted isoquinolinones, isoquinolinediones, isoquinolinetriones and dihydroisoquinolinones of the general formula (I) or their respective salts where the radicals in the general formula (I) correspond to the definitions given in the description, for enhancing stress tolerance in plants to abiotic stress, for strengthening plant growth and/or for increasing plant yield, and selected processes for preparing the compounds mentioned above.

  使用通式（I）中的替代的异喹啉酮、异喹啉二酮、异喹啉三酮和二氢异喹啉酮或它们的相应盐，其中通式（I）中的基团对应于描述中给出的定义，用于增强植物对非生物胁迫的耐受性，增强植物生长和/或增加植物产量，并选择性地制备上述化合物的过程。
• Indium Triiodide Catalyzed Direct Hydroallylation of Esters
  作者：Yoshihiro Nishimoto、Yoshihiro Inamoto、Takahiro Saito、Makoto Yasuda、Akio Baba

  DOI：10.1002/ejoc.201000475

  日期：——

  InI 3 -catalyzed hydroallylation of esters by using hydro-and allysilanes under mild conditions has been accomplished. Many significant groups such as alkenyl, alkynyl, cyano, and nitro ones survive under these conditions. This reaction system provided routes to both homoallylic alcohols and ethers, in which either elimination of the alkoxy moiety or of the carbonyl oxygen atom could be freely selected

  通过在温和条件下使用氢化硅烷和烯丙基硅烷完成了 InI 3 催化的酯的氢化烯丙基化。许多重要的基团，如链烯基、炔基、氰基和硝基基团在这些条件下仍然存在。该反应体系为高烯丙醇和醚提供了途径，其中烷氧基部分或羰基氧原子的消除可以通过改变烷氧基部分和氢硅烷上的取代基自由选择。此外，内酯的氢烯丙基化发生在不开环的情况下，以高产率生产所需的环醚。
• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160244400A1

  公开（公告）日：2016-08-25

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L 1 represents a C1-C8 fluorinated alkanediyl group, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L 1 , and R 2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.

  化合物的化学式（I）表示如下： 其中，R1代表氢原子、卤素原子或C1-C6烷基，其中氢原子可以被卤素原子取代，L1代表C1-C8氟代烷二基基团，X1代表*—CO—O—、*—O—CO—、*—O—CO—O—或*—O—，其中*代表与L1结合位点，R2代表C1-C18烃基团，其中亚甲基基团可以被氧原子、羰基团或磺酰基团取代，其中氢原子可以被羟基取代，或其中两个氢原子可以分别被氧原子取代，与氧原子结合形成一个与氧原子结合的C1-C8烷二基基团一起形成一个缩醛结构，所述缩醛结构中的氢原子可以被氟原子取代。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。