Reactions forming electronically-excited free radicals. Part 2.—Formation of N<sup>4</sup>S, N<sup>2</sup>D and N<sup>2</sup>P atoms in the H + NF<sub>2</sub>reaction, and N atom reactions
作者:Chew Toong Cheah、Michael A. A. Clyne
DOI:10.1039/f29807601543
日期:——
The kinetics of reactions (at 298 K) involving ground-state N 4S and excited-state N 2D, 2P atoms have been studied using resonance-fluorescence detection in a discharge-flow system. The N 4S+ NO reaction has been studied as a reference reaction: N 4S+ NO [graphic omitted] N2+ O; k1=(3.4 ± 0.3)× 10–11 cm3 molecule–1 s–1(1σ). Also, the rate constant k2 for the N 4S+ NF2 reaction has been determined:
在放电流系统中使用共振荧光检测研究了涉及基态N 4 S和激发态N 2 D,2 P原子的反应动力学(在298 K下)。已经研究了N 4 S + NO反应作为参考反应:N 4 S + NO [省略图示] N 2 + O; k 1 =(3.4±0.3)×10 –11 cm 3分子–1 s –1(1σ)。另外,N 4 S + NF的速率常数k 2已确定2反应:N 4 S + NF 2 [图中省略] 2 NF; k 2 =(4.6±0.3)×10 –12 cm 3分子–1 s –1( 1σ)。将反应ħ 2小号+ NF 2给出了NF的基团一个1个Δ状态与分支比0.9:H 2小号+ NF 2 →NF一个1 Δ+ HF X 1 Σ +。该结论是根据对N 4浓度分布的研究得出的。小号和N 2个d的状态下-选择性的反应原子(4一),(4 b):H 2小号+ NF一个1 Δ→Ñ 2 d + HF X 1 Σ +(4一),H