COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20180065930A1
公开(公告)日:2018-03-08
A compound represented by the following formula (1).
(in formula (1), each X independently represents an oxygen atom, a sulfur atom, or non-crosslinking, each R
1
is independently selected from the group consisting of a hydrogen atom, a halogen group, a nitro group, an amino group, a hydroxyl group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group may have an ether bond, a ketone bond or an ester bond, each R
2
independently represents a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R
2
represents a group having a hydroxyl group or a thiol group, each m is independently an integer of 1 to 7, each p is independently 0 or 1, each q is independently an integer of 0 to 4, and n is 0 or 1.)
以下是公式(1)代表的化合物的中文翻译:在公式(1)中,每个X独立地代表一个氧原子、一个硫原子或非交联,每个R1独立地选自包括氢原子、卤素基团、硝基、氨基、羟基、具有1至30个碳原子的烷基基团、具有2至30个碳原子的烯烃基团、具有6至40个碳原子的芳基团及其组合的群,其中烷基基团、烯烃基团和芳基团可能具有醚键、酮键或酯键,每个R2独立地代表具有1至30个碳原子的线性、支链或环状烷基基团、具有6至40个碳原子的芳基团、具有2至30个碳原子的烯烃基团、硫醇基团或羟基,其中至少一个R2代表具有羟基或硫醇基团的基团,每个m独立地是1至7的整数,每个p独立地为0或1,每个q独立地是0至4的整数,n为0或1。