申请人:Isono Yoshimi
公开号:US20110301305A1
公开(公告)日:2011-12-08
According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride.
[Chem. 134]
AOCF
2
C-Q-CF
2
COA′ (M-1)
In the above formula, Q represents a divalent organic group having a substituted or unsubstituted aromatic ring; and A and A′ each independently represent an organic group. This polymer exhibits a sufficiently low dielectric constant for use as a semiconductor protection film and has the capability of forming a film at a relatively low temperature of 250° C. or lower.
根据本发明,通过将通式(M-1)的含氟二羧酸衍生物或含氟二羧酸酸酐与具有与含氟二羧酸衍生物或酸酐的羰基部分相对应的两到四个反应性基团的多官能化合物进行聚合缩合反应,可以得到一种聚合物。[Chem. 134]AOCF2C-Q-CF2COA′ (M-1)在上述公式中,Q代表具有取代或未取代芳香环的二价有机基团; A和A'各自独立地表示有机基团。该聚合物表现出足够低的介电常数,可用作半导体保护膜,并具有在相对较低的温度下(250℃或更低)形成膜的能力。