Silane Composition and Cured Film Thereof, and Method for Forming Negative Resist Pattern Using Same
申请人:Central Class Company, Limited
公开号:US20140242516A1
公开(公告)日:2014-08-28
A composition provided to contain:
an alkoxysilane condensate obtained by the condensation of
alkoxysilane A represented by general formula (1): (CH
3
)Si(OR
1
)
3
(In the general formula (1), R
1
mutually independently represents methyl group or ethyl group.),
alkoxysilane B represented by general formula (2): (Ph)Si(OR
1
)
3
(In the general formula (2), R
1
mutually independently represents methyl group or ethyl group.), and
alkoxysilane C represented by general formula (3): (CH
3
)
2
Si(OR
1
)
2
(In the general formula (3), R
1
mutually independently represents methyl group or ethyl group.) at an A:B:C mole ratio within the range of 30-70:10-50:20-60; and
a polyether-modified polydimethylsiloxane.