N-[4-[[4-(propan-2-ylideneamino)phenyl]methyl]phenyl]propan-2-imine

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-[4-[[4-(propan-2-ylideneamino)phenyl]methyl]phenyl]propan-2-imine
• 化学式: C₁₉H₂₂N₂
• 分子量: 278.4
• InChiKey: MTHBBRBTXRAZDG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.26
• 拓扑面积：
  24.7
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• US20140273457A1
  申请人：——

  公开号：US20140273457A1

  公开（公告）日：2014-09-18
• Anti-Reflective Layer and Method
  申请人：Taiwan Semiconductor Manufacturing Company, Ltd.

  公开号：US20150111384A1

  公开（公告）日：2015-04-23

  A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom. The anti-reflective layers are removed using a fluid.
• Photoresist Layer and Method
  申请人：Liu Chen-Yu

  公开号：US20160013041A1

  公开（公告）日：2016-01-14

  A system and method for middle layers is provided. In an embodiment the middle layer comprises a floating component in order to form a floating region along a top surface of the middle layer after the middle layer has dispersed. The floating component may be a polymer with a floating group incorporated into the polymer. The floating group may comprise a fluorine atom.
• Method for Manufacturing Semiconductor Device
  申请人：Taiwan Semiconductor Manufacturing Company, Ltd.

  公开号：US20160155626A1

  公开（公告）日：2016-06-02

  A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom. The anti-reflective layers are removed using a fluid.
• Composition And Method For Lithography Patterning
  申请人：Taiwan Semiconductor Manufacturing Company, Ltd.

  公开号：US20160238933A1

  公开（公告）日：2016-08-18

  An anti-reflective coating (ARC) composition for use in lithography patterning and a method of using the same is disclosed. In an embodiment, the ARC composition comprises a polymer having a chromophore; an acid labile group (ALG), more than 5% by weight; a thermal acid generator; and an optional crosslinker. The method includes applying the ARC composition over a substrate; crosslinking the polymer to form an ARC layer; cleaving the ALG of the ARC layer to reduce a film density of the ARC layer; forming a resist layer over the ARC layer, patterning the resist layer, and etching the ARC layer. Due to reduced film density, the ARC layer has a high etching rate, thereby preserving the critical dimension (CD) of the resist pattern during the etching process.