4-n-Propyl-2,5-dimethylphenol | 104174-71-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-n-Propyl-2,5-dimethylphenol
• 英文别名: 2,5-Dimethyl-4-propylphenol；2,5-dimethyl-4-propylphenol
• CAS: 104174-71-2
• 化学式: C₁₁H₁₆O
• 分子量: 164.247
• InChiKey: XBLSTMLMODEXBV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  2-(allyloxy)-1,4-dimethylbenzene 在 二异丁基氢化铝 作用下， 以 正己烷 、 二氯甲烷 为溶剂， 反应 12.0h， 生成 4-n-Propyl-2,5-dimethylphenol 、 4-Allyl-2,5-xylenol 、 2-allyl-3,6-dimethylphenol 、 3-Hydroxy-1.4-dimethyl-2-propyl-benzol
  参考文献：
  名称：

  Sharma; Ilangovan; Sreenivas, Punna, Synlett, 2000, # 5, p. 615 - 618

  摘要：

  DOI：

文献信息

• Methanofullerenes
  申请人：Robinson Alex Philip Graham

  公开号：US20140134843A1

  公开（公告）日：2014-05-15

  The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物、它们的光刻胶组合物和方法非常适合使用紫外线辐射、超极紫外线辐射、极紫外线辐射、X射线和带电粒子束进行精细图案加工。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERRÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014078097A1

  公开（公告）日：2014-05-22

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物，它们的光刻胶组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线等技术进行精细图案处理。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014137663A1

  公开（公告）日：2014-09-12

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

  本公开涉及新型甲烷富勒烯衍生物，制备其负型光阻组合物和使用它们的方法。这些衍生物、它们的光阻组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线进行精细图案处理。还公开了负光敏组合物。
• POLYAZOLE FIBER AND METHOD FOR PRODUCING SAME
  申请人：Teijin Limited

  公开号：EP1947222A1

  公开（公告）日：2008-07-23

  This invention seeks to provide a fiber formed of an aromatic polyazole that has a high molecular weight and is excellent in mechanical properties such as elastic modulus, strength, etc., and a process for the production thereof. This invention provides a fiber formed of a polyazole containing a recurring unit of the following formula (1), wherein Ar1 is a divalent aromatic group having 4 to 20 carbon atoms, Ar2 is a tetravalent aromatic group having 4 to 20 carbon atoms and each X is O, S or NH, and having a phosphorus atom content of 30 ppm or less, and a process for the production thereof.

  本发明旨在提供一种由芳香族聚唑形成的纤维，该纤维具有高分子量和优异的机械性能，如弹性模量、强度等，以及其生产工艺。 本发明提供了一种由含有下式 (1) 循环单元的聚唑形成的纤维、 其中 Ar1 是具有 4 至 20 个碳原子的二价芳香基团，Ar2 是具有 4 至 20 个碳原子的四价芳香基团，每个 X 是 O、S 或 NH、 且磷原子含量不超过 30 ppm，以及其生产工艺。
• Multiple trigger photoresist compositions and methods
  申请人：Robinson Alex Phillip Graham

  公开号：US10095112B2

  公开（公告）日：2018-10-09

  The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型多触发阴性工作光刻胶组合物和工艺。这些工艺包括在第一步中去除交联官能团上的酸标签保护基团，在第二步中用酸敏感交联剂交联交联官能团。在光刻胶催化链中加入多重触发途径可增加接受低剂量辐照区域的化学梯度，有效地起到内置剂量依赖性淬火器-模拟器的作用，从而提高化学梯度，进而提高分辨率、分辨率模糊度和曝光宽容度。光刻胶组合物和方法非常适合使用紫外线辐射、超强紫外线辐射、极紫外线辐射、X 射线和带电粒子射线等进行精细图案处理。