BLOCK COPOLYMER COMPRISING BLOCK HAVING POLYSILANE SKELETON AND BLOCK HAVING POLYSILAZANE SKELETON
申请人:Merck Patent GmbH
公开号:US20210230374A1
公开(公告)日:2021-07-29
[Problem] To provide a novel polymer, which fills trenches having narrow widths and high aspect ratios and can form a thicker film. [Means for Solution] The block copolymer comprises a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon.