[EN] AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME<br/>[FR] GÉNÉRATEURS DE PHOTOACIDE EXEMPTS DE FLUOR AROMATIQUE ET COMPOSITIONS DE RÉSINE PHOTOSENSIBLE LES CONTENANT
申请人:IBM
公开号:WO2009091704A2
公开(公告)日:2009-07-23
Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193nm (ArF) imaging radiation.