Feniodium | 71585-34-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Feniodium
• 英文别名: bis(2,4-dichlorophenyl)iodanium
• CAS: 71585-34-7
• 化学式: C12H6Cl4I+
• 分子量: 418.9
• InChiKey: YIQHETKPLWWHBD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.9
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• [EN] DENTAL COMPOSITION COMPRISING A PARTICULATE CARRIER SUPPORTING A COINITIATOR<br/>[FR] COMPOSITION DENTAIRE COMPRENANT UN SUPPORT PARTICULAIRE CONTENANT UN CO-INITIATEUR
  申请人：DENTSPLY DETREY GMBH

  公开号：WO2019043056A1

  公开（公告）日：2019-03-07

  The present invention relates to a dental composition comprising a photoinitiator system comprising a particulate carrier supporting a coinitiator covalently bonded to the surface of the carrier. Furthermore, the present invention relates to a use of the particulate carrier in a dental composition. The particulate carrier displays multiple covalently bonded tertiary amino groups and/or tertiary phosphine groups on the surface, for crosslinking monomers, oligomers and/or polymers having one or more polymerizable double bonds.

  本发明涉及一种牙科组合物，其包括一种光引发剂系统，该系统包括一种颗粒载体，支持着与载体表面共价结合的辅助引发剂。此外，本发明涉及将该颗粒载体用于牙科组合物的用途。该颗粒载体在表面显示多个共价结合的三级胺基团和/或三级膦基团，用于交联具有一个或多个可聚合双键的单体、寡聚物和/或聚合物。
• [EN] PHOTOCURABLE DENTAL COMPOSITION<br/>[FR] COMPOSITION DENTAIRE PHOTODURCISSABLE
  申请人：DENTSPLY DETREY GMBH

  公开号：WO2019072787A1

  公开（公告）日：2019-04-18

  The present invention relates to a photocurable dental composition comprising a specific polymerization initiator system containing the combination of a photoinitiator compound and a coinitiator compound being a sulfinate compound or a sulfonate compound. The present invention also relates to the use of this polymerization initiator system in a photocurable dental composition.

  本发明涉及一种光固化牙科组合物，包括一种特定的聚合引发剂体系，其中包含光引发剂化合物和共同引发剂化合物的组合，后者是磺酸盐化合物或亚磺酸盐化合物。本发明还涉及将该聚合引发剂体系用于光固化牙科组合物的用途。
• Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt
  申请人：Nagamori Masashi

  公开号：US20110112306A1

  公开（公告）日：2011-05-12

  A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.]

  提供一种含氟磺酸盐或含有含氟磺酸基团的化合物，其结构由下列通式（1）表示。这种盐或化合物可以作为合适的光酸发生剂，并且可以形成具有优异敏感度、分辨率和掩模依赖性的光阻图案。[在通式（1）中，R代表取代或未取代的具有1至30个碳原子的线性或支链一价碳氢基团，取代或未取代的具有3至30个碳原子且具有环状或部分环状结构的一价碳氢基团，取代或未取代的具有6至30个碳原子的芳基团，或取代或未取代的具有4至30个碳原子的一价杂环有机基团。]
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130078579A1

  公开（公告）日：2013-03-28

  A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R 1 represents a monovalent organic group having 1 to 20 carbon atoms. R 2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R 2 is as defined in the above formula (1). X represents an electron attractive group. R 3 represents a monovalent organic group having 1 to 20 carbon atoms.

  一种辐射敏感的树脂组合物，包括一个酸发生剂，通过辐射放射线产生下式（1）所代表的化合物。在式（1）中，R1代表具有1至20个碳原子的一价有机基团。R2代表氢原子或具有1至20个碳原子的一价有机基团。式（1）所代表的化合物最好是由下式（1-1）所代表的化合物。在式（1-1）中，R2如上式（1）所定义。X代表电子吸引基团。R3代表具有1至20个碳原子的一价有机基团。
• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。