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Benzenamine, 2,2'-[sulfonylbis(4,1-phenyleneoxy)]bis- | 52338-52-0

中文名称
——
中文别名
——
英文名称
Benzenamine, 2,2'-[sulfonylbis(4,1-phenyleneoxy)]bis-
英文别名
2-[4-[4-(2-aminophenoxy)phenyl]sulfonylphenoxy]aniline
Benzenamine, 2,2'-[sulfonylbis(4,1-phenyleneoxy)]bis-化学式
CAS
52338-52-0
化学式
C24H20N2O4S
mdl
——
分子量
432.5
InChiKey
FJYCAYKHNVQCJW-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.4
  • 重原子数:
    31
  • 可旋转键数:
    6
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    113
  • 氢给体数:
    2
  • 氢受体数:
    6

文献信息

  • NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20190169211A1
    公开(公告)日:2019-06-06
    The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).
    本发明是基于本文中的情况而作出的。本发明的目的是提供:一种四羧酸二酐,可导致聚酰亚胺,作为感光树脂组合物的基树脂,能够形成细微图案并获得高分辨率,同时不损害优异的特性,如机械强度和粘附性;通过使用该四羧酸二酐获得的聚酰亚胺树脂;以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式(1)所示。
  • Thermosensitive recording material and color developer compound therefor
    申请人:——
    公开号:US20040071187A1
    公开(公告)日:2004-04-15
    A thermosensitive recording material has a support and a thermosensitive coloring layer formed thereon containing a leuco dye and a color developer capable of inducing color formation in the leuco dye upon application of heat thereto, with the color developer including at least one compound (A) having in a molecule thereof at least two aromatic ring moieties with specific structures, selected from the group consisting of an aromatic ring moiety having at least one carboxyl group and electron-attracting functional group, an aromatic ring moiety having at least one carboxyl group and electron-donating functional group, and an aromatic ring moiety having at least one carboxyl group, free of the electron-attracting and electron-donating functional groups. An aromatic carboxylic acid compound serving as the above-mentioned compound (A) and the producing method thereof are also disclosed.
    一种热敏感记录材料具有支撑体和在其上形成的热敏感着色层,其中该着色层含有一种白色染料和一种色素显色剂,能够在施加热量时诱导白色染料发生显色反应,其中色素显色剂包括至少一种化合物(A),其分子中至少含有两个具有特定结构的芳香环基团,所述芳香环基团选自具有至少一个羧基和电子吸引基团的芳香环基团、具有至少一个羧基和电子给予基团的芳香环基团以及不含电子吸引和电子给予功能基团的芳香环基团。还公开了作为上述化合物(A)的芳香羧酸化合物及其生产方法。
  • DIAMINE COMPOUND, AND HEAT-RESISTANT RESIN OR HEAT-RESISTANT RESIN PRECURSOR USING SAME
    申请人:TORAY INDUSTRIES, INC.
    公开号:US20170334837A1
    公开(公告)日:2017-11-23
    Provided are a photosensitive resin composition which has excellent pattern processabilities (high sensitivity and high resolution) and is excellent in chemical resistance and thermal resistance after thermally treated; a heat-resistant resin or heat-resistant resin precursor used for the composition; and a diamine compound which is a raw material of the resin and the precursor. The diamine compound is a diamine compound represented by a general formula (1).
    提供了一种具有优异图案加工性(高灵敏度和高分辨率)且在热处理后具有优异化学耐性和热耐性的光敏树脂组合物;用于该组合物的耐热树脂或耐热树脂前体;以及作为树脂和前体原料的二胺化合物。该二胺化合物是由通式(1)表示的二胺化合物。
  • Photosensitive polymer composition, method for forming relief patterns, and electronic parts
    申请人:——
    公开号:US20010031419A1
    公开(公告)日:2001-10-18
    A positive-type, heat-resistant photosensitive polymer composition comprising (a) a polyimide precursor or a polyimide which is soluble in an aqueous alkaline solution, (b) a compound capable of generating an acid when exposed to light, and (c) a compound having a phenolic hydroxyl group; a method of forming a relief pattern comprising a step of applying the composition onto a substrate and drying it thereon, a step of exposing it, a step of developing it, and a step of heating it; and an electronic part having as a surface-protecting film or an interlayer insulating film.
    一种正型、耐热、光敏聚合物组合物,包括(a)聚酰亚胺前体或可溶于水性碱性溶液的聚酰亚胺,(b)一种能在光照下产生酸的化合物,以及(c)一种具有酚羟基的化合物;一种形成浮雕图案的方法,包括将该组合物涂覆在基板上并在其上干燥,曝光,显影和加热的步骤;以及作为表面保护膜或层间绝缘膜的电子部件。
  • Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
    申请人:LEE Jong-Hwa
    公开号:US20130171563A1
    公开(公告)日:2013-07-04
    Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R 11 , R 12 , R 13 , and R 14 in Chemical Formulae 1 and 2 are the same as defined in the detailed description, a positive photosensitive resin composition including the same, a photosensitive resin film fabricated using the same, and a semiconductor device including the photosensitive resin composition.
    本发明公开了一种光敏性新乐酸树脂,其中包括由以下化学式1表示的结构单元和由以下化学式2表示的结构单元,其中化学式1和2中的R11,R12,R13和R14与详细描述中定义的相同,以及包括该树脂的正向光敏树脂组合物,使用该组合物制造的光敏树脂膜,以及包括该光敏树脂组合物的半导体器件。
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