Benzenesulfonic acid, 4-pentadecyl- | 76964-45-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Benzenesulfonic acid, 4-pentadecyl-
• 英文别名: 4-pentadecylbenzenesulfonic acid
• CAS: 76964-45-9
• 化学式: C₂₁H₃₆O₃S
• 分子量: 368.6
• InChiKey: VUYWJXDCUBLTLO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.6
• 重原子数：
  25
• 可旋转键数：
  15
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Photoresist remover compositions
  申请人：Merck Patent GmbH

  公开号：US11366392B2

  公开（公告）日：2022-06-21

  The present invention relates to a composition consisting essentially of an alkylbenzenesulfonic acid having structure (I) (wherein n is an integer from 0 to 16); a solvent which is either selected from the group consisting of solvents having structures (II), (wherein R is selected from the group consisting of —(—O—CH2—CH2—)n—OH, —OH, —O—C(═O)—CH3, wherein n′ is equal to 1, 2, 3, or 4), a solvent having structure (III), a solvent having structure (IV), and a solvent having structure (V), or a solvent mixture, of at least two solvents selected from this group. In another embodiment, the composition also consists of, additionally, a surfactant component. This invention also relates to using either of these compositions to remove a patterned photoresist from a substrate.

  本发明涉及一种组合物，其主要成分为具有结构（I）的烷基苯磺酸（其中 n 为 0 至 16 的整数）；溶剂，该溶剂可以选自具有结构(II)的溶剂（其中R选自-(-O-CH2-CH2-)n-OH、-OH、-O-C(═O)-CH3组成的组，其中n′等于1、2、3或4）、具有结构(III)的溶剂、具有结构(IV)的溶剂和具有结构(V)的溶剂，或至少两种选自该组的溶剂混合物。在另一个实施方案中，组合物还包括表面活性剂成分。本发明还涉及使用这些组合物中的任一种从基底上去除图案化光阻。
• Method for producing binder resin, particulate resin dispersion and method for producing same, electrostatic image development toner and method for producing same, electrostatic image developer, and image forming method
  申请人：Sasaki Yuki

  公开号：US20070122730A1

  公开（公告）日：2007-05-31

  A method for producing a binder resin comprises polycondensing a polycondensable monomer by using a polycondensation catalyst that comprises: at least one of compounds of formula (I) or (II); and at least one of compounds represented of formula (III) or (IV), wherein weight ratio of total amount of the compounds of formula (I) or (II) to total amount of the compounds of formula (III) or (IV) is from 5:95 to 95:5: wherein R 1 represents a C 8 -C 20 straight-chain alkyl group; R 2 represents a monovalent organic group; and number n of substituents R 2 represents an integer of from 0 to 4; R 3 —SO 3 H  (II) wherein R 3 represents a C 8 -C 20 straight-chain alkyl group; wherein R 4 represents a C 8 -C 20 branched alkyl group; R 5 represents a monovalent organic group; and number m of substituents R 5 represents an integer of from 0 to 4; and R 6 —SO 3 H  (IV) wherein R 6 represents a C 8 -C 20 branched alkyl group.
• PHOTORESIST REMOVER COMPOSITIONS
  申请人：Merck Patent GmbH

  公开号：US20210080833A1

  公开（公告）日：2021-03-18

  The present invention relates to a composition consisting essentially of an alkylbenzenesulfonic acid having structure (I) (wherein n is an integer from 0 to 16); a solvent which is either selected from the group consisting of solvents having structures (II), (wherein R is selected from the group consisting of —(—O—CH 2 —CH 2 —) n —OH, —OH, —O—C(═O)—CH 3 , wherein n′ is equal to 1, 2, 3, or 4), a solvent having structure (III), a solvent having structure (IV), and a solvent having structure (V), or a solvent mixture, of at least two solvents selected from this group. In another embodiment, the composition also consists of, additionally, a surfactant component. This invention also relates to using either of these compositions to remove a patterned photoresist from a substrate.
• US8637632B2
  申请人：——

  公开号：US8637632B2

  公开（公告）日：2014-01-28