申请人:Watanabe Takeru
公开号:US20080102405A1
公开(公告)日:2008-05-01
A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
一种抗蚀组合物包括作为猝灭剂的氮含有机化合物,其含有氮杂环,并且分子量至少为380,具有高分辨率和令人满意的掩膜覆盖度依赖性,并且适用于使用电子束或深紫外光进行微细加工。