2-[(4-Hydroxy-3,5-dimethylphenyl)methyl]-4,6-dimethylphenol | 67024-62-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-[(4-Hydroxy-3,5-dimethylphenyl)methyl]-4,6-dimethylphenol
• CAS: 67024-62-8
• 化学式: C₁₇H₂₀O₂
• 分子量: 256.34
• InChiKey: SSPFZCYHJXFTJC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP1644426A1

  公开（公告）日：2006-04-12
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200292939A1

  公开（公告）日：2020-09-17

  A photosensitive resin composition; a photosensitive dry film which includes a photosensitive resin layer formed from the composition; a method of manufacturing the photosensitive dry film; a method of manufacturing a patterned resist film using the composition; a method of manufacturing a substrate with a template using the composition; and a method of manufacturing a plated article using the substrate with the template. In a photosensitive resin composition containing a resin which includes a (meth)acrylic polymer including a carboxy group, a specific amount of compound including a phenolic hydroxyl group and/or a mercapto group is contained together with a polyfunctional vinyl ether monomer.
• US4360659A
  申请人：——

  公开号：US4360659A

  公开（公告）日：1982-11-23
• US4374233A
  申请人：——

  公开号：US4374233A

  公开（公告）日：1983-02-15
• US4345051A
  申请人：——

  公开号：US4345051A

  公开（公告）日：1982-08-17